Photocatalytic Anatase TiO2 Thin Films on Polymer Optical Fiber Using Atmospheric-Pressure Plasma

2017 ◽  
Vol 9 (15) ◽  
pp. 13733-13741 ◽  
Author(s):  
Kamal Baba ◽  
Simon Bulou ◽  
Patrick Choquet ◽  
Nicolas D. Boscher
Catalysts ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 91
Author(s):  
Suresh Gosavi ◽  
Rena Tabei ◽  
Nitish Roy ◽  
Sanjay S. Latthe ◽  
Y. M. Hunge ◽  
...  

Titanium dioxide (TiO2) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In this work TiO2 thin films have been deposited onto both glass and silicon substrates by the atmospheric pressure plasma jet (APPJ) technique. The structure and morphological properties of TiO2 thin films are studied using different characterization techniques like X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and field emission scanning electron microscopy. XRD study reveals the bronze-phase of TiO2. The XPS study shows the presence of Ti, O, C, and N elements. The FE-SEM study shows the substrate surface is well covered with a nearly round shaped grain of different size. The optical study shows that all the deposited TiO2 thin films exhibit strong absorption in the ultraviolet region. The oleic acid photocatalytic decomposition study demonstrates that the water contact angle decreased from 80.22 to 27.20° under ultraviolet illumination using a TiO2 photocatalyst.


Coatings ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 357 ◽  
Author(s):  
Yu Xu ◽  
Yu Zhang ◽  
Tao He ◽  
Ke Ding ◽  
Xiaojiang Huang ◽  
...  

Amorphous TiO2 thin films were respectively annealed by 13.56 MHz radio frequency (RF) atmospheric pressure plasma at discharge powers of 40, 60, 80 W and thermal treatment at its corresponding substrate temperature (Ts). Ts was estimated through three measurement methods (thermocouple, Newton’s law of cooling and OH optical emission spectra simulation) and showed identically close results of 196, 264 and 322 °C, respectively. Comparing with thermal annealing, this RF atmospheric pressure plasma annealing process has obvious effects in improving crystallization of the amorphous films, based on the XRD and Raman analysis of the film. Amorphous TiO2 film can be changed to anatase film at about 264 °C of Ts for 30 min plasma treatment, while it almost remains amorphous after 322 °C thermal treatment for the same time.


2014 ◽  
Vol 314 ◽  
pp. 1074-1081 ◽  
Author(s):  
Jia-Yang Juang ◽  
Tung-Sheng Chou ◽  
Hsin-Tien Lin ◽  
Yuan-Fang Chou ◽  
Chih-Chiang Weng

2020 ◽  
Vol 404 ◽  
pp. 126498
Author(s):  
Ming Gao ◽  
Yu Wang ◽  
Yongliang Zhang ◽  
Ying Li ◽  
Yao Tang ◽  
...  

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