scholarly journals Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering

2008 ◽  
Vol 26 (2) ◽  
pp. 288-296 ◽  
Author(s):  
Y. P. Purandare ◽  
A. P. Ehiasarian ◽  
P. Eh. Hovsepian
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Vapor Deposition ◽  
Physical Vapor Deposition

scholarly journals Biocompatibility and antibacterial properties of TiCu(Ag) thin films produced by physical vapor deposition magnetron sputtering

2021 ◽  
pp. 151604
Author(s):  
Saqib Rashid ◽  
Gian Marco Vita ◽  
Luca Persichetti ◽  
Giovanna Iucci ◽  
Chiara Battocchio ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Antibacterial Properties

Magnetron Sputtering for Low-temperature Deposition of CdTe-based Photovoltaics

2003 ◽  
Vol 763 ◽  
Author(s):  
Alvin D. Compaan
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
High Efficiency ◽  
Chemical Vapor ◽  
Rf Magnetron Sputtering ◽  
Polycrystalline Thin Film ◽  
Thin Film Semiconductors ◽  
Temperature Deposition

AbstractAlthough the deposition over large areas of polycrystalline thin-film semiconductors such as CdTe is possible by a variety of methods including close spaced sublimation, vapor transport deposition, physical vapor deposition, organometallic chemical vapor deposition, and electrodeposition, the use of a plasma-based method such as magnetron sputtering can have significant advantages. In this paper I review recent results from our group in the fabrication of CdS/CdTe cells using rf magnetron sputtering and discuss some of the advantages that appear possible from the use of sputtering methods in this class of materials. Some of these advantages are particularly relevant as the polycrystalline thin-film community address issues related to the challenges of fabricating high efficiency tandem cells with efficiencies over 25%. Recently we have achieved: improvements in sputtered cell performance with cells based on commercial SnO2:F as well as on substrates with our own sputtered ZnO:Al, progress in the use of reactive sputtering for the deposition of oxygen alloys of CdS and N-doped layers of ZnTe, and progress in the sputtering of wider and narrower bandgap alloys of CdTe with Zn, Mn, and Hg. Details of the sputtering process and some of the recent achievements are discussed below.

scholarly journals Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS)

2021 ◽  
Vol 11 (6) ◽  
pp. 2753
Author(s):  
Bastian Gaedike ◽  
Svenja Guth ◽  
Frank Kern ◽  
Andreas Killinger ◽  
Rainer Gadow
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Physical Vapor Deposition ◽  
Target Material ◽  
Electrical Insulation ◽  
Electrically Conductive ◽  
New Approach ◽  
Conductive Oxide ◽  
Short Circuits ◽  
Carbide Ceramics

Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process. When depositing electrically non-conductive oxide ceramics as coatings with HiPIMS without dual magnetron sputtering (DMS) or mid-frequency (MF) sputtering, the growing coating leads to increasing electrical insulation of the anode. As a consequence, short circuits occur, and the process breaks down. This phenomenon is also known as the disappearing anode effect. In this study, a new approach involving adding electrically conductive carbide ceramics was tried to prevent the electrical insulation of the anode and thereby guarantee process stability. Yttria-stabilized zirconia (3YSZ) with 30 vol.% titanium carbide (TiC) targets are used in a non-reactive HiPIMS process. The main focus of this study is a parameter inquisition. Different HiPIMS parameters and their impact on the measured current at the substrate table are analyzed. This study shows the successful use of electrically conductive carbide ceramics in a non-conductive oxide as the target material. In addition, we discuss the observed high table currents with a low inert gas mix, where the process was not expected to be stable.

Tribological Performances of CrSiN Coatings Deposited by High Power Pulse Magnetron Sputtering

2018 ◽  
Vol 281 ◽  
pp. 540-545 ◽  
Author(s):  
Wei Jie Chang ◽  
Hao Zhang ◽  
Ying Ying Chen ◽  
Jun Li ◽  
Xue Zhang ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Magnetron Sputtering ◽  
High Power ◽  
Physical Vapor Deposition ◽  
Protective Coatings ◽  
Energy Dispersive Spectrometer ◽  
Testing Machine ◽  
Power Pulse ◽  
Pulse Magnetron ◽  
High Power Pulse

The coatings deposited by physical vapor deposition (PVD) technique have found a wide industrial application as protective coatings for their attractive properties such as high hardness, good wear resistance and chemical stability. In order to explore the triboligical performances of CrSiN coatings, CrSiN coatings were prepared o the surface of 316 stainless steel by high power pulse magnetron sputtering (HPPMS) in this paper. Sliding wear tests of CrSiN coatings against Si3N4 ceramic balls and titanium balls have been carried out on a friction abrasion testing machine under reciprocating sliding conditions. nanoindentation and scratch tester, field emission scanning electron microscopy equipped with energy dispersive spectrometer (FESEM/EDS) and a X-ray diffractometer (XRD) was used to study the tribological behaviors of CrSiN coatings systematically. Results showed that CrSiN coatings exhibited good wear resistance, which can be attributed to the smoother and denser surface of CrSiN coatings resulted from much fewer macroparticles and pitting defects. The differences on wear debris removal behaviors and wear mechanism were caused by the different microstructure of CrSiN coatings.

Sign in / Sign up

Export Citation Format

Share Document