Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks

Pei-yang Yan; Eberhard Spiller; Paul Mirkarimi

doi:10.1116/1.2799963

Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2799963 ◽

2007 ◽

Vol 25 (6) ◽

pp. 1859 ◽

Cited By ~ 7

Author(s):

Pei-yang Yan ◽

Eberhard Spiller ◽

Paul Mirkarimi

Keyword(s):

Thin Films ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Capping Layer

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Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.5560 ◽

2005 ◽

Vol 44 (7B) ◽

pp. 5560-5564 ◽

Cited By ~ 14

Author(s):

Sang-Ho Lee ◽

Young-Jae Kang ◽

Jin-Goo Park ◽

Ahmed A. Busnaina ◽

Jong-Myung Lee ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Laser Shock ◽

Ultraviolet Lithography ◽

Capping Layer

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Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

Journal of Applied Physics ◽

10.1063/1.2952033 ◽

2008 ◽

Vol 104 (1) ◽

pp. 013305 ◽

Cited By ~ 15

Author(s):

S. Namba ◽

S. Fujioka ◽

H. Sakaguchi ◽

H. Nishimura ◽

Y. Yasuda ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Light Sources ◽

Extreme Ultraviolet Lithography ◽

Plasma Parameters ◽

Ultraviolet Lithography

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Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4766879 ◽

2012 ◽

Vol 30 (6) ◽

pp. 06F505 ◽

Cited By ~ 2

Author(s):

Hee Young Kang ◽

Pazhanisami Peranantham ◽

Chang Kwon Hwangbo ◽

Hwan-Seok Seo ◽

Seong-Su Kim ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patterns

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1319843 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2930 ◽

Cited By ~ 2

Author(s):

Moonsuk Yi ◽

Seongtae Jeong ◽

Seno Rekawa ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Far Field ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography

10.1117/12.351136 ◽

1999 ◽

Cited By ~ 2

Author(s):

Nen-Wen Pu ◽

Seongtae Jeong ◽

Rian Zhao ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Ultrasonic Characterization

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Characterization of multilayer reflective coatings for extreme ultraviolet lithography

10.1063/1.1291768 ◽

2000 ◽

Author(s):

Marco Wedowski

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Reflective Coatings

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Improved oxidation resistance of Ru/Si capping layer for extreme ultraviolet lithography reflector

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3596560 ◽

2011 ◽

Vol 29 (4) ◽

pp. 041602 ◽

Cited By ~ 2

Author(s):

Jeong Y. Park ◽

Leonid Belau ◽

Hyungtak Seo ◽

Gabor A. Somorjai

Keyword(s):

Oxidation Resistance ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Capping Layer

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Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography

Applied Optics ◽

10.1364/ao.34.006513 ◽

1995 ◽

Vol 34 (28) ◽

pp. 6513 ◽

Cited By ~ 13

Author(s):

H. A. Bender ◽

D. O’Connell ◽

W. T. Silfvast

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Particulate Debris

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Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography

Microelectronic Engineering ◽

10.1016/j.mee.2005.11.012 ◽

2006 ◽

Vol 83 (3) ◽

pp. 476-484 ◽

Cited By ~ 15

Author(s):

Keith C. Thompson ◽

Erik L. Antonsen ◽

Matthew R. Hendricks ◽

Brian E. Jurczyk ◽

M. Williams ◽

...

Keyword(s):

Experimental Test ◽

Extreme Ultraviolet ◽

Test Chamber ◽

Plasma Source ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chamber Design ◽

Exposure Testing

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Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.34.63 ◽

2021 ◽

Vol 34 (1) ◽

pp. 63-70

Author(s):

Eric Liu ◽

Amir Hegazy ◽

Hyeonseon Choi ◽

Maximilian Weires ◽

Robert Brainard ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Surface Variation ◽

Chemically Amplified Photoresist

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