Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results

2007 ◽  
Vol 25 (6) ◽  
pp. 2114 ◽  
Author(s):  
Yuusuke Tanaka ◽  
Yukiko Kikuchi ◽  
DooHoon Goo ◽  
Hiroaki Oizumi ◽  
Iwao Nishiyama
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography

2011 ◽  
Vol 50 (6S) ◽  
pp. 06GD03 ◽  
Author(s):  
Yasuharu Tajima ◽  
Kazumasa Okamoto ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryoko Fujiyoshi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radical Cation ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography

2011 ◽  
Vol 50 (6) ◽  
pp. 06GD03 ◽  
Author(s):  
Yasuharu Tajima ◽  
Kazumasa Okamoto ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryoko Fujiyoshi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radical Cation ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation

2011 ◽  
Vol 50 (1R) ◽  
pp. 016504 ◽  
Author(s):  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryuji Ohnishi ◽  
Takafumi Endo ◽  
Rikimaru Sakamoto
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Extreme Ultraviolet Radiation
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