Optimizing the dielectric performance of TiO2 thin films through control of plasma-enhanced chemical vapor deposition process conditions

Wenli Yang; Alexander Monson; Joseph Marino; Colin A. Wolden

doi:10.1116/1.2484649

Optimizing the dielectric performance of TiO2 thin films through control of plasma-enhanced chemical vapor deposition process conditions

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2484649 ◽

2007 ◽

Vol 25 (4) ◽

pp. 1298-1301 ◽

Cited By ~ 4

Author(s):

Wenli Yang ◽

Alexander Monson ◽

Joseph Marino ◽

Colin A. Wolden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Process Conditions ◽

Tio2 Thin Films ◽

Dielectric Performance ◽

Vapor Deposition Process

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Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Advanced Powder Technology ◽

10.1016/j.apt.2009.12.014 ◽

2010 ◽

Vol 21 (2) ◽

pp. 136-140 ◽

Cited By ~ 13

Author(s):

Dong-Joo Kim ◽

Jin-Yi Kang ◽

Kyo-Seon Kim

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Plasma Chemical ◽

Tio2 Thin Films ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Process

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Characteristics of ferroelectric Sr0.7Bi2.1Ta2.0O9 thin films grown by liquid delivery metal organic chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2005.07.115 ◽

2005 ◽

Vol 492 (1-2) ◽

pp. 140-145 ◽

Cited By ~ 1

Author(s):

Byong-Ho Kim ◽

Dong-Kyun Kang

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Vapor Deposition Process

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OPTIMIZATION OF THE CHEMICAL VAPOR DEPOSITION PROCESS FOR THE FABRICATION OF THIN FILMS

Equipment ◽

10.1615/ihtc13.p11.60 ◽

2006 ◽

Cited By ~ 3

Author(s):

P. George ◽

Yogesh Jaluria ◽

H. C. Gea

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Conformal, Conducting Poly(3,4-ethylenedioxythiophene) Thin Films Deposited Using Bromine as the Oxidant in a Completely Dry Oxidative Chemical Vapor Deposition Process

Chemistry of Materials ◽

10.1021/cm100092c ◽

2010 ◽

Vol 22 (9) ◽

pp. 2864-2868 ◽

Cited By ~ 65

Author(s):

Hitesh Chelawat ◽

Sreeram Vaddiraju ◽

Karen Gleason

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Preparation of nanoparticle-embedded thin films by simultaneous feeding of gaseous and solid raw materials in plasma-enhanced chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2017.04.042 ◽

2017 ◽

Vol 632 ◽

pp. 55-65 ◽

Cited By ~ 1

Author(s):

Masaru Kubo ◽

Tomoya Taguchi ◽

Manabu Shimada

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Raw Materials ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Cubic and tetragonal maghemite formation inside carbon nanotubes under chemical vapor deposition process conditions

Fullerenes Nanotubes and Carbon Nanostructures ◽

10.1080/1536383x.2020.1784146 ◽

2020 ◽

Vol 28 (11) ◽

pp. 913-918

Author(s):

B. A. Kulnitskiy ◽

V. Z. Mordkovich ◽

A. R. Karaeva ◽

S. A. Urvanov ◽

V. D. Blank

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Process Conditions ◽

Vapor Deposition Process

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Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80227-3 ◽

1991 ◽

Vol 137-138 ◽

pp. 741-744 ◽

Cited By ~ 11

Author(s):

C. Wang ◽

G. Lucovsky ◽

R.J. Nemanich

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Remote Plasma ◽

Vapor Deposition Process

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Perspective: Highly ordered MoS2 thin films grown by multi-step chemical vapor deposition process

APL Materials ◽

10.1063/1.4943288 ◽

2016 ◽

Vol 4 (3) ◽

pp. 030901 ◽

Cited By ~ 21

Author(s):

S. N. Heo ◽

Y. Ishiguro ◽

R. Hayakawa ◽

T. Chikyow ◽

Y. Wakayama

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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One-step fabrication of high quality double-walled carbon nanotube thin films by a chemical vapor deposition process

Carbon ◽

10.1016/j.carbon.2010.06.046 ◽

2010 ◽

Vol 48 (13) ◽

pp. 3817-3824 ◽

Cited By ~ 47

Author(s):

Jian-Min Feng ◽

Rui Wang ◽

Ya-Li Li ◽

Xiao-Hua Zhong ◽

Lan Cui ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

High Quality ◽

One Step ◽

Vapor Deposition Process

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A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

Dalton Transactions ◽

10.1039/d0dt02471f ◽

2020 ◽

Vol 49 (38) ◽

pp. 13462-13474

Author(s):

Jan-Lucas Wree ◽

Engin Ciftyurek ◽

David Zanders ◽

Nils Boysen ◽

Aleksander Kostka ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Elemental Sulfur ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Metalorganic Chemical ◽

Vapor Deposition Process

Crystalline MoS2 thin films are deposited via MOCVD using a new molybdenum precursor, 1,4-di-tert-butyl-1,4-diazabutadienyl-bis(tert-butylimido)molybdenum(vi) [Mo(NtBu)2(tBu2DAD)], and elemental sulfur.

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