Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists
2019 ◽
Vol 150
(5)
◽
pp. 2216-2254
1990 ◽
Vol 430
(1879)
◽
pp. 315-345
◽
2009 ◽
Vol 108
(2)
◽
pp. 356-363
◽
1995 ◽
Vol 28
(13)
◽
pp. 3599-3621
◽