Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering
2006 ◽
Vol 24
(6)
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pp. 2206-2211
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2017 ◽
Vol 62
(1)
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pp. 133-138
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2015 ◽
Vol 1120-1121
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pp. 424-428
1965 ◽
Vol 20
(9)
◽
pp. 847-850
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