Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering

1995 ◽  
Vol 78 (12) ◽  
pp. 7416-7418 ◽  
Author(s):  
T. Okada ◽  
S. Yamada ◽  
Y. Takeuchi ◽  
T Wada
Keyword(s):  
High Pressure ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Carbon Nitride ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering

Effect of CxNyMolecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering

2008 ◽  
Vol 47 (11) ◽  
pp. 8530-8533 ◽  
Author(s):  
Kimin Roh ◽  
Byung-Keun Na ◽  
Si-Kyoung Choi ◽  
Jung-Hyung Kim ◽  
Dae-Jin Seong ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Carbon Nitride ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering

Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering

2006 ◽  
Vol 252 (12) ◽  
pp. 4185-4189 ◽  
Author(s):  
Lihua Liu ◽  
Yuxin Wang ◽  
Kecheng Feng ◽  
Yingai Li ◽  
Weiqing Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Carbon Nitride ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Boron Carbon Nitride ◽  
Boron Carbon
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