Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect

Junghoon Yeom; Yan Wu; John C. Selby; Mark A. Shannon

doi:10.1116/1.2101678

Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.2101678 ◽

2005 ◽

Vol 23 (6) ◽

pp. 2319 ◽

Cited By ~ 94

Author(s):

Junghoon Yeom ◽

Yan Wu ◽

John C. Selby ◽

Mark A. Shannon

Keyword(s):

Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Ratio Dependent ◽

Dependent Transport

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Aspect ratio dependent etching in advanced deep reactive ion etching of quartz

2017 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP) ◽

10.1109/dtip.2017.7984500 ◽

2017 ◽

Author(s):

P. Chapellier ◽

P. Lavenus ◽

B. Bourgeteau-Verlhac ◽

C. Gageant ◽

O. Le Traon ◽

...

Keyword(s):

Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Ratio Dependent

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Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

Microelectronic Engineering ◽

10.1016/j.mee.2013.06.010 ◽

2014 ◽

Vol 113 ◽

pp. 35-39 ◽

Cited By ~ 36

Author(s):

Jayalakshmi Parasuraman ◽

Anand Summanwar ◽

Frédéric Marty ◽

Philippe Basset ◽

Dan E. Angelescu ◽

...

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching

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Realization of high aspect ratio nano-pillar type photonic crystal by deep reactive ion etching

Digest of the LEOS Summer Topical Meetings Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004. ◽

10.1109/leosst.2004.1338718 ◽

2004 ◽

Author(s):

H.G. Teo ◽

M.B. Yu ◽

J. Singh ◽

N. Ranga ◽

J. Li ◽

...

Keyword(s):

Photonic Crystal ◽

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching

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Ultra Deep Reactive Ion Etching of High Aspect-Ratio and Thick Silicon Using a Ramped-Parameter Process

Journal of Microelectromechanical Systems ◽

10.1109/jmems.2018.2843722 ◽

2018 ◽

Vol 27 (4) ◽

pp. 686-697 ◽

Cited By ~ 16

Author(s):

Yemin Tang ◽

Amin Sandoughsaz ◽

Kevin J. Owen ◽

Khalil Najafi

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching

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Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2010.1737 ◽

2010 ◽

Vol 10 (1) ◽

pp. 497-501 ◽

Cited By ~ 5

Author(s):

David Caballero ◽

Guillermo Villanueva ◽

Jose Antonio Plaza ◽

Christopher A. Mills ◽

Josep Samitier ◽

...

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Focused Ion Beam ◽

Ion Beam ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Afm Tips

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Effects of deep reactive ion etching parameters on etching rate and surface morphology in extremely deep silicon etch process with high aspect ratio

Advances in Mechanical Engineering ◽

10.1177/1687814017738152 ◽

2017 ◽

Vol 9 (12) ◽

pp. 168781401773815 ◽

Cited By ~ 7

Author(s):

Tiantong Xu ◽

Zhi Tao ◽

Hanqing Li ◽

Xiao Tan ◽

Haiwang Li

Keyword(s):

Aspect Ratio ◽

Surface Morphology ◽

High Aspect Ratio ◽

Etching Rate ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Etching Parameters

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Ultra high aspect ratio sub-micron silicon micromachining by double-passivation deep reactive ion etching

10.7567/ssdm.2006.a-3-3 ◽

2006 ◽

Author(s):

Ranganathan Nagarajan ◽

B. Ramana Murthy

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Silicon Micromachining

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Antistick Postpassivation of High-Aspect Ratio Silicon Molds Fabricated by Deep-Reactive Ion Etching

Journal of Microelectromechanical Systems ◽

10.1109/jmems.2005.863795 ◽

2006 ◽

Vol 15 (1) ◽

pp. 84-93 ◽

Cited By ~ 32

Author(s):

J.X. Gao ◽

L.P. Yeo ◽

M.B. Chan-Park ◽

J.M. Miao ◽

Y.H. Yan ◽

...

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching

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SiC Wafer Bonding and Deep Reactive Ion Etching Towards High-Aspect Ratio SiC MEMS Fabrication

ECS Transactions ◽

10.1149/08605.0105ecst ◽

2018 ◽

Vol 86 (5) ◽

pp. 105-110 ◽

Cited By ~ 3

Author(s):

Lunet E Luna ◽

Karl D. Hobart ◽

Marko J Tadjer ◽

Rachael L. Myers-Ward ◽

Travis J. Anderson ◽

...

Keyword(s):

Aspect Ratio ◽

Wafer Bonding ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Mems Fabrication ◽

Sic Wafer

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Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures

Microelectronics Journal ◽

10.1016/j.mejo.2005.04.039 ◽

2005 ◽

Vol 36 (7) ◽

pp. 673-677 ◽

Cited By ~ 196

Author(s):

F. Marty ◽

L. Rousseau ◽

B. Saadany ◽

B. Mercier ◽

O. Français ◽

...

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Three Dimensional ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Silicon Based

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