Conductive nanostructure fabrication by focused ion beam direct-writing of silver nanoparticles

2004 ◽  
Vol 22 (6) ◽  
pp. 2987 ◽  
Author(s):  
David S. Kong ◽  
Jonathan S. Varsanik ◽  
Saul Griffith ◽  
Joseph M. Jacobson
Keyword(s):  
Silver Nanoparticles ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Direct Writing ◽  
Nanostructure Fabrication

scholarly journals An Experiment-Based Profile Function for the Calculation of Damage Distribution in Bulk Silicon Induced by a Helium Focused Ion Beam Process

Sensors ◽  
2020 ◽  
Vol 20 (8) ◽  
pp. 2306 ◽  
Author(s):  
Qianhuang Chen ◽  
Tianyang Shao ◽  
Yan Xing
Keyword(s):  
Beam Energy ◽  
Focused Ion Beam ◽  
Crystalline Silicon ◽  
Ion Beam ◽  
Single Crystalline Silicon ◽  
Nanostructure Fabrication ◽  
Profile Function ◽  
Single Crystalline ◽  
Prediction Function ◽  
Wide Range

The helium focused ion beam (He-FIB) is widely used in the field of nanostructure fabrication due to its high resolution. Complicated forms of processing damage induced by He-FIB can be observed in substrates, and these damages have a severe impact on nanostructure processing. This study experimentally investigated the influence of the beam energy and ion dose of He-FIB on processing damage. Based on the experimental results, a prediction function for the amorphous damage profile of the single-crystalline silicon substrate caused by incident He-FIB was proposed, and a method for calculating the amorphous damage profile by inputting ion dose and beam energy was established. Based on one set of the amorphous damage profiles, the function coefficients were determined using a genetic algorithm. Experiments on single-crystalline silicon scanned by He-FIB under different process parameters were carried out to validate the model. The proposed experiment-based model can accurately predict the amorphous damage profile induced by He-FIB under a wide range of different ion doses and beam energies.

Two-dimensional ordered growth of InAs nanowires assisted by randomly deposited silver nanoparticles on a topographically modified surface by a focused ion beam

2019 ◽  
Vol 493 ◽  
pp. 271-278
Author(s):  
R. Ribeiro-Andrade ◽  
T.L. Vasconcelos ◽  
R.M.S. Kawabata ◽  
M.P. Pires ◽  
P.L. Souza ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Two Dimensional ◽  
Inas Nanowires ◽  
Modified Surface

Nano-photomask fabrication using focused ion beam direct writing

CIRP Annals ◽  
2010 ◽  
Vol 59 (1) ◽  
pp. 543-546 ◽  
Author(s):  
F.Z. Fang ◽  
Z.W. Xu ◽  
X.T. Hu ◽  
C.T. Wang ◽  
X.G. Luo ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Direct Writing

GaN nanostructure fabrication by focused-ion-beam-assisted chemical vapor deposition

2005 ◽  
Vol 87 (1) ◽  
pp. 013103 ◽  
Author(s):  
T. Nagata ◽  
P. Ahmet ◽  
Y. Sakuma ◽  
T. Sekiguchi ◽  
T. Chikyow
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Nanostructure Fabrication

Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 4107-4110 ◽  
Author(s):  
Reo Kometani ◽  
Takahiko Morita ◽  
Keiichiro Watanabe ◽  
Kazuhiro Kanda ◽  
Yuichi Haruyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Nanostructure Fabrication ◽  
Glass Capillary

Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

2000 ◽  
Vol 18 (6) ◽  
pp. 3181 ◽  
Author(s):  
Shinji Matsui ◽  
Takashi Kaito ◽  
Jun-ichi Fujita ◽  
Masanori Komuro ◽  
Kazuhiro Kanda ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Nanostructure Fabrication
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