Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists

2004 ◽  
Vol 22 (6) ◽  
pp. 3522 ◽  
Author(s):  
Hiroki Yamamoto ◽  
Takahiro Kozawa ◽  
Atsuro Nakano ◽  
Kazumasa Okamoto ◽  
Seiichi Tagawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Hydroxyl Groups ◽  
Generation Efficiency ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Protection Ratio

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6049-6051 ◽  
Author(s):  
Takahiro Kozawa ◽  
Mitsuru Uesaka ◽  
Yoichi Yoshida ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Study of Radiation-Induced Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 2, No. 11A) ◽  
pp. L1574-L1576 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists
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