Investigation of surface modifications of 193 and 248 nm photoresist materials during low-pressure plasma etching

2004 ◽  
Vol 22 (6) ◽  
pp. 2594 ◽  
Author(s):  
L. Ling ◽  
X. Hua ◽  
X. Li ◽  
G. S. Oehrlein ◽  
E. A. Hudson ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Surface Modifications ◽  
Low Pressure ◽  
Pressure Plasma ◽  
Low Pressure Plasma

Mechanism of oxygen and argon low pressure plasma etching on polyethylene (UHMWPE)

2019 ◽  
Vol 378 ◽  
pp. 124990 ◽  
Author(s):  
Silvana Marques Miranda Spyrides ◽  
Felipe Sampaio Alencastro ◽  
Erick Fassio Guimaraes ◽  
Fernando Luiz Bastian ◽  
Renata Antoun Simao
Keyword(s):  
Plasma Etching ◽  
Low Pressure ◽  
Pressure Plasma ◽  
Low Pressure Plasma

The dynamics of hot F atoms in low pressure plasma etching reactors

1992 ◽  
Vol 166 (3) ◽  
pp. 317-328 ◽  
Author(s):  
Bernie Shizgal ◽  
Andrew S. Clarke
Keyword(s):  
Plasma Etching ◽  
Low Pressure ◽  
Pressure Plasma ◽  
Low Pressure Plasma

Low pressure plasma etching of silicon carbide

2005 ◽  
Vol 81 (4) ◽  
pp. 793-797 ◽  
Author(s):  
B. Kim ◽  
S. Kim ◽  
B.T. Lee
Keyword(s):  
Silicon Carbide ◽  
Plasma Etching ◽  
Low Pressure ◽  
Pressure Plasma ◽  
Low Pressure Plasma
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