Improvement of electrochemical properties in LiCoO2 cathode films grown on Pt∕TiO2∕SiO2∕Si substrates by liquid-delivery metalorganic chemical vapor deposition

Woon-Gi Choi; Soon-Gil Yoon

doi:10.1116/1.1798791

Improvement of electrochemical properties in LiCoO2 cathode films grown on Pt∕TiO2∕SiO2∕Si substrates by liquid-delivery metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1798791 ◽

2004 ◽

Vol 22 (6) ◽

pp. 2356-2360 ◽

Cited By ~ 5

Author(s):

Woon-Gi Choi ◽

Soon-Gil Yoon

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical ◽

Licoo2 Cathode ◽

Liquid Delivery

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Preparation and Characterization of RuOxThin Films by Liquid Delivery Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.2667 ◽

2004 ◽

Vol 43 (5A) ◽

pp. 2667-2671 ◽

Cited By ~ 1

Author(s):

Kyoung-Won Kim ◽

Nam-Soo Kim ◽

Hyung-Gyoo Lee ◽

Yeong-Seuk Kim ◽

Hee-Jae Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical ◽

Liquid Delivery

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Degradation of GaAs lasers grown by metalorganic chemical vapor deposition on Si substrates

Applied Physics Letters ◽

10.1063/1.98997 ◽

1987 ◽

Vol 51 (2) ◽

pp. 89-91 ◽

Cited By ~ 71

Author(s):

J. P. van der Ziel ◽

R. D. Dupuis ◽

R. A. Logan ◽

C. J. Pinzone

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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CHARACTERISATION OF FERROELECTRIC PbZrXTi1-XO3 (PZT) THIN FILMS PREPARED BY LIQUID-DELIVERY METALORGANIC CHEMICAL VAPOR DEPOSITION

Integrated Ferroelectrics ◽

10.1080/10584580600663748 ◽

2006 ◽

Vol 81 (1) ◽

pp. 289-295 ◽

Cited By ~ 1

Author(s):

S. MATICHYN ◽

M. LISKER ◽

M. SILINSKAS ◽

B. GARKE ◽

E. BURTE

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Pzt Thin Films ◽

Metalorganic Chemical ◽

Liquid Delivery

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Compositional Dependence of Electrical Properties of Highly (100)-/(001)-Oriented Pb(Zr,Ti)O3Thick Films Prepared on Si Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.5922 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 5922-5926 ◽

Cited By ~ 18

Author(s):

Shintaro Yokoyama ◽

Yoshihisa Honda ◽

Hitoshi Morioka ◽

Gouji Asano ◽

Takahiro Oikawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Compositional Dependence ◽

Si Substrates ◽

Metalorganic Chemical

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Improvement in ferroelectric properties of SrBi2Ta2O9 thin films with Bi2O3 buffer layers by liquid-delivery metalorganic chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1400077 ◽

2001 ◽

Vol 79 (10) ◽

pp. 1519-1521 ◽

Cited By ~ 27

Author(s):

Woong-Chul Shin ◽

Soon-Gil Yoon

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Ferroelectric Properties ◽

Chemical Vapor ◽

Buffer Layers ◽

Metalorganic Chemical ◽

Liquid Delivery

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Electrical and microstructural properties of BaTiO3 thin films on p-Si substrates grown by metalorganic chemical vapor deposition

Solid State Communications ◽

10.1016/0038-1098(93)90140-i ◽

1993 ◽

Vol 86 (9) ◽

pp. 565-568 ◽

Cited By ~ 9

Author(s):

T.W. Kim ◽

M. Jung ◽

Y.S. Yoon ◽

W.N. Kang ◽

H.S. Shin ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Microstructural Properties ◽

Si Substrates ◽

Metalorganic Chemical

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Low‐threshold high‐efficiency AlGaAs‐GaAs double‐heterostructure injection lasers grown on Si substrates by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.98185 ◽

1987 ◽

Vol 50 (7) ◽

pp. 407-409 ◽

Cited By ~ 38

Author(s):

R. D. Dupuis ◽

J. P. van der Ziel ◽

R. A. Logan ◽

J. M. Brown ◽

C. J. Pinzone

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Double Heterostructure ◽

Si Substrates ◽

Low Threshold ◽

Injection Lasers ◽

Metalorganic Chemical

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Metalorganic Chemical Vapor Deposition of Copper Using (Hexafluoroacetylacetonate)Cu(I)(3,3-dimethyl-1-butene) with a Liquid Delivery System

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.2962 ◽

2002 ◽

Vol 41 (Part 1, No. 5A) ◽

pp. 2962-2968 ◽

Cited By ~ 10

Author(s):

Kyeong-Keun Choi ◽

Sung G. Pyo ◽

Dok Won Lee ◽

Shi-Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Delivery System ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical ◽

Liquid Delivery

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Catalyst-free synthesis of ZnO nanowall networks on Si3N4∕Si substrates by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2216107 ◽

2006 ◽

Vol 88 (25) ◽

pp. 253114 ◽

Cited By ~ 46

Author(s):

Sang-Woo Kim ◽

Shizuo Fujita ◽

Min-Su Yi ◽

Dae Ho Yoon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Catalyst Free ◽

Metalorganic Chemical

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Preparation and Characterization of Epitaxial Lead Zirconate Titanate Films on Pt/(Ti, Al)N/TiN/Si Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.5441 ◽

2000 ◽

Vol 39 (Part 1, No. 9B) ◽

pp. 5441-5445 ◽

Cited By ~ 6

Author(s):

Atsushi Sakurai ◽

Xio Min Li ◽

Kohsuke Shiratsuyu ◽

Katsuhiko Tanaka ◽

Yukio Sakabe

Keyword(s):

Chemical Vapor Deposition ◽

Lead Zirconate Titanate ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Lead Zirconate ◽

Si Substrates ◽

Zirconate Titanate ◽

Metalorganic Chemical

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