Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and deposition

2004 ◽  
Vol 22 (6) ◽  
pp. 2342-2346 ◽  
Author(s):  
I. V. Afanasyev-Charkin ◽  
L. G. Jacobsohn ◽  
R. D. Averitt ◽  
M. Nastasi
Keyword(s):  
Silicon Nitride ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Room Temperature ◽  
Discharge Plasma ◽  
Glow Discharge Plasma ◽  
Pulsed Glow Discharge ◽  
Amorphous Silicon Nitride ◽  
Silicon Nitride Films ◽  
Plasma Immersion Ion Implantation

The Generation and Bleaching of Positive Charge in Gate-Quality Nitrogen-Rich Amorphous Silicon Nitride By Sub-Bandgap Illumination

1990 ◽  
Vol 192 ◽  
Author(s):  
J. Kanicki ◽  
M. Sankaran
Keyword(s):  
Silicon Nitride ◽  
Time Dependence ◽  
Amorphous Silicon ◽  
Room Temperature ◽  
Positive Charge ◽  
Amorphous Silicon Nitride ◽  
Exponential Time ◽  
Stretched Exponential ◽  
Silicon Nitride Films ◽  
First Time

ABSTRACTWe report, for the first time, on the stretched-exponential time dependence of the generation and bleaching of positive charge in gate-quality nitrogen-rich amorphous silicon nitride films subjected to the sub-bandgap illumination at room temperature in vacuum. We also propose a mechanism which we believe is responsible for the generation and bleaching of the positive charge in the nitride films.

scholarly journals Effect of Thermal Annealing on the Photoluminescence of Dense Si Nanodots Embedded in Amorphous Silicon Nitride Films

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 354
Author(s):  
Qianqian Liu ◽  
Xiaoxuan Chen ◽  
Hongliang Li ◽  
Yanqing Guo ◽  
Jie Song ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Chemical Vapor ◽  
Peak Position ◽  
Excitation Wavelength ◽  
Very High Frequency ◽  
Amorphous Silicon Nitride ◽  
Silicon Nitride Films ◽  
High Frequency Plasma

Luminescent amorphous silicon nitride-containing dense Si nanodots were prepared by using very-high-frequency plasma-enhanced chemical vapor deposition at 250 °C. The influence of thermal annealing on photoluminescence (PL) was studied. Compared with the pristine film, thermal annealing at 1000 °C gave rise to a significant enhancement by more than twofold in terms of PL intensity. The PL featured a nanosecond recombination dynamic. The PL peak position was independent of the excitation wavelength and measured temperatures. By combining the Raman spectra and infrared absorption spectra analyses, the enhanced PL was suggested to be from the increased density of radiative centers related to the Si dangling bonds (K0) and N4+ or N20 as a result of bonding configuration reconstruction.

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