Influence of substrate bias on practical adhesion, toughness, and roughness of reactive dc-sputtered zirconium nitride films

2004 ◽  
Vol 22 (5) ◽  
pp. 2041-2047 ◽  
Author(s):  
Cheng-Shi Chen ◽  
Chuan-Pu Liu ◽  
Heng-Ghieh Yang ◽  
C.-Y. A. Tsao
Keyword(s):  
Zirconium Nitride ◽  
Substrate Bias ◽  
Influence Of Substrate ◽  
Adhesion Toughness

Influence of substrate bias on the properties of a-C:H films prepared by plasma CVD

1993 ◽  
Vol 164-166 ◽  
pp. 1127-1130 ◽  
Author(s):  
S. Xu ◽  
M. Hundhausen ◽  
J. Ristein ◽  
B. Yan ◽  
L. Ley
Keyword(s):  
Substrate Bias ◽  
Plasma Cvd ◽  
Influence Of Substrate

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films

The effect of substrate bias on the characteristics of CrN coatings deposited by DC-superimposed HiPIMS system

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744032 ◽  
Author(s):  
X. Zuo ◽  
F. Xia ◽  
D. Zhang ◽  
P. L. Ke ◽  
Q. M. Wang ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Indentation Test ◽  
Grain Structure ◽  
Substrate Bias ◽  
Cross Sectional ◽  
Microstructure And Mechanical Properties ◽  
Columnar Grain ◽  
Influence Of Substrate ◽  
Crn Coatings

Chromium nitride coatings were prepared by reactive DC-superimposed high-power-impulse magnetron sputtering (HiPIMS) system. The influence of substrate bias on the microstructure and mechanical properties of CrN coatings was investigated. XRD and cross-sectional SEM were utilized to characterize the film structures. Mechanical properties were characterized by nanoindentation and Vickers indentation test. The results revealed that the microstructure and mechanical properties of CrN coatings were affected by bias voltage. The CrN coatings exhibited dense and fine columnar grain structure with the hardness of about 18.7 GPa. The fracture toughness of CrN coatings was around 3.16 MPa ⋅ m[Formula: see text]. However, further increase of the bias voltage from −250 V to −300 V led to the degradation of coating properties.

Influence of substrate bias voltage on the microstructure of nc-SiO x :H film

2015 ◽  
Vol 24 (2) ◽  
pp. 028102 ◽  
Author(s):  
Hui-Min Li ◽  
Wei Yu ◽  
Yan-Mei Xu ◽  
Yun Ji ◽  
Zhao-Yi Jiang ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate

Influence of substrate bias on composition and structure of reactively r.f.-sputtered TiC films

1981 ◽  
Vol 80 (1-3) ◽  
pp. 77-83 ◽  
Author(s):  
J.-E. Sundgren ◽  
B.-O. Johansson ◽  
S.-E. Karlsson
Keyword(s):  
Substrate Bias ◽  
Composition And Structure ◽  
Influence Of Substrate

Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method

2009 ◽  
Vol 63 (26) ◽  
pp. 2181-2184 ◽  
Author(s):  
Joon Woo Bae ◽  
Jae-Won Lim ◽  
Kouji Mimura ◽  
Masahito Uchikoshi ◽  
Mitsuhiro Wada ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Ion Beam ◽  
Substrate Bias ◽  
Deposition Method ◽  
Substrate Bias Voltage ◽  
Ion Beam Deposition ◽  
Influence Of Substrate ◽  
Beam Deposition
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