Hollow electrode enhanced radio frequency glow plasma and its application to the chemical vapor deposition of microcrystalline silicon

Toshihiro Tabuchi; Hiroyuki Mizukami; Masayuki Takashiri

doi:10.1116/1.1774200

Hollow electrode enhanced radio frequency glow plasma and its application to the chemical vapor deposition of microcrystalline silicon

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1774200 ◽

2004 ◽

Vol 22 (5) ◽

pp. 2139-2144 ◽

Cited By ~ 22

Author(s):

Toshihiro Tabuchi ◽

Hiroyuki Mizukami ◽

Masayuki Takashiri

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Hollow Electrode ◽

Glow Plasma

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Fast chemical vapor deposition of microcrystalline silicon by applying magnetic field to hollow electrode enhanced radio frequency glow plasma

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.128 ◽

2007 ◽

Vol 202 (1) ◽

pp. 114-120 ◽

Cited By ~ 4

Author(s):

T. Tabuchi ◽

M. Takashiri ◽

K. Ishida

Keyword(s):

Magnetic Field ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Hollow Electrode ◽

Glow Plasma ◽

Fast Chemical

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Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.371292 ◽

1999 ◽

Vol 86 (7) ◽

pp. 3812-3821 ◽

Cited By ~ 122

Author(s):

P. Alpuim ◽

V. Chu ◽

J. P. Conde

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Microcrystalline Silicon

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High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

Science in China Series E ◽

10.1007/s11431-008-0034-8 ◽

2008 ◽

Vol 51 (4) ◽

pp. 371-377 ◽

Cited By ~ 1

Author(s):

BingQing Zhou ◽

MeiFang Zhu ◽

FengZhen Liu ◽

JinLong Liu ◽

YuQin Zhou ◽

...

Keyword(s):

High Pressure ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

High Rate ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Frequency Plasma

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Surface Chemistry of Preferentially (111)- and (220)-Crystal-Oriented Microcrystalline Silicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.081402 ◽

2010 ◽

Vol 49 (8) ◽

pp. 081402 ◽

Cited By ~ 1

Author(s):

Daisuke Ohba ◽

Chien-Hui Lai ◽

Zeguo Tang ◽

Hajime Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Surface Chemistry ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Frequency Plasma

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Retraction: “Surface Chemistry of Preferentially (111)- and (220)-Crystal-Oriented Microcrystalline Silicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition”

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.089203 ◽

2016 ◽

Vol 55 (8) ◽

pp. 089203 ◽

Cited By ~ 10

Author(s):

Daisuke Ohba ◽

Chien-Hui Lai ◽

Zeguo Tang ◽

Hajime Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Surface Chemistry ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Frequency Plasma

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Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.12.029 ◽

2005 ◽

Vol 483 (1-2) ◽

pp. 84-88 ◽

Cited By ~ 14

Author(s):

Yuan-Min Li ◽

Liwei Li ◽

J.A. Anna Selvan ◽

Alan E. Delahoy ◽

Roland A. Levy

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Frequency Plasma

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Cited By ~ 40

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2004.06.035 ◽

2004 ◽

Vol 42 (14) ◽

pp. 2867-2872 ◽

Cited By ~ 332

Author(s):

Jianjun Wang ◽

Mingyao Zhu ◽

Ron A. Outlaw ◽

Xin Zhao ◽

Dennis M. Manos ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Carbon Nanosheets ◽

Inductively Coupled ◽

Frequency Plasma

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Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00714-0 ◽

2000 ◽

Vol 266-269 ◽

pp. 31-37 ◽

Cited By ~ 162

Author(s):

P Roca i Cabarrocas

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Microcrystalline Silicon

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