Isotropic/anisotropic growth behavior and faceting morphology of Si epitaxial layer selectively grown by cold wall ultrahigh vacuum chemical vapor deposition
2004 ◽
Vol 22
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pp. 275
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1996 ◽
Vol 14
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pp. 170-183
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2016 ◽
Vol 34
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2003 ◽
Vol 42
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1994 ◽
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