Thickness effects on properties of GaInNAs quantum dots grown by molecular-beam epitaxy with nitrogen plasma source

2003 ◽  
Vol 21 (6) ◽  
pp. 2428 ◽  
Author(s):  
K. C. Yew ◽  
S. F. Yoon ◽  
Z. Z. Sun
Keyword(s):  
Quantum Dots ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma

InNAs and GaInNAs self-assembled quantum dots and lasers grown by solid source molecular beam epitaxy

2003 ◽  
Vol 794 ◽  
Author(s):  
Z.Z. Sun ◽  
S.F. Yoon ◽  
K.C. Yew ◽  
B.X. Bo
Keyword(s):  
Quantum Dots ◽  
Optical Properties ◽  
Molecular Beam Epitaxy ◽  
Quantum Dot ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma ◽  
Force Microscopy ◽  
Self Assembled ◽  
Dot Density

ABSTRACTSelf-assembled Ga1−xInxNyAs1-y quantum dots were grown on GaAs by solid source molecular beam epitaxy (SSMBE). Introduction of N was achieved by a RF Nitrogen plasma source. Formation of quantum dots by S-K growth mode is confirmed by observation of standard 2D-3D RHEED pattern transition. Atomic force microscopy (AFM) and photoluminescence (PL) measurements were used to characterize the structure and optical properties of GaInNAs quantum dots. High GaInNAs quantum dot density (1010∼1011cm−2) was obtained for different In and N composition (0.3≤ x ≤1, y≤0.01). The effect of surface coverage on dot density, dot size, and optical properties was studied in detail. Adjusting the bandgap confinement by incorporating a GaNAs strain-reduction layer into the GaInNAs dot layer was found to extend the emission wavelength by 170nm. Room temperature pulsed operation is demonstrated for a Ga0.5In0.5N0.01As0.99 quantum dot laser emitting at ∼1.1μm.

p‐type CdSe grown by molecular beam epitaxy using a nitrogen plasma source

1994 ◽  
Vol 65 (4) ◽  
pp. 466-468 ◽  
Author(s):  
Takeo Ohtsuka ◽  
Junji Kawamata ◽  
Ziqiang Zhu ◽  
Takafumi Yao
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma ◽  
P Type

Heavyp‐doping of ZnTe by molecular beam epitaxy using a nitrogen plasma source

1993 ◽  
Vol 62 (8) ◽  
pp. 840-842 ◽  
Author(s):  
J. Han ◽  
T. S. Stavrinides ◽  
M. Kobayashi ◽  
R. L. Gunshor ◽  
M. M. Hagerott ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma

Low Resistance Ohmic Contact on p-type GaN Grown by Plasma-Assisted Molecular Beam Epitaxy

1996 ◽  
Vol 423 ◽  
Author(s):  
Myung C. Yoo ◽  
J. W. Lee ◽  
J. M. Myoung ◽  
K. H. Shim ◽  
K. Kim
Keyword(s):  
Molecular Beam Epitaxy ◽  
Ohmic Contacts ◽  
Doping Concentration ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma ◽  
Specific Contact Resistance ◽  
Metal Bilayers ◽  
Auger Microscopy ◽  
P Type

AbstractOhmic contacts on p-type GaN have been investigated. High quality GaN epilayers on cplane sapphire were prepared using plasma-assisted molecular beam epitaxy that utilized an inductively coupled rf nitrogen plasma source and solid source beams. The resulting film thickness and the doping concentration of the grown samples were in the range of 0.7–1.35 μm and 1018 – 1020/cm3, respectively. The metallization consisted of high work function metal bilayers which included a combinations of 25 nm-thick Ni, Ti, Pt and/or Cr and 200 nm-thick Au on the highly p-doped GaN in a transmission line model pattern. Ohmic contacts were formed by alloying the bi-layers using rapid thermal annealing (RTA) at temperatures in the range of 300–700 °C for 1 min under nitrogen ambient. Current-voltage measurements showed that the specific contact resistance was as low as 1.2 × 10 −4 Ω–cm2 for the sample having 1.4 × 1020/cm3p-type doping concentration with a Cr/Au contact annealed at 500 °C for 1 min by RTA. Judging from the scanning Auger microscopy results and the glancing angle x-ray diffraction analysis, this resistance is attributed to Cr diffusion into the GaN layer.

Some aspects of GaN growth on GaAs(100) substrates using molecular beam epitaxy with an RF activated nitrogen-plasma source

1995 ◽  
Vol 155 (3-4) ◽  
pp. 157-163 ◽  
Author(s):  
S.E. Hooper ◽  
C.T. Foxon ◽  
T.S. Cheng ◽  
L.C. Jenkins ◽  
D.E. Lacklison ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma

Optimization of nitrogen plasma source parameters by measurements of emitted light intensity for growth of GaN by molecular beam epitaxy

2013 ◽  
Vol 534 ◽  
pp. 107-110 ◽  
Author(s):  
K. Klosek ◽  
M. Sobanska ◽  
G. Tchutchulashvili ◽  
Z.R. Zytkiewicz ◽  
H. Teisseyre ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Light Intensity ◽  
Molecular Beam ◽  
Source Parameters ◽  
Plasma Source ◽  
Nitrogen Plasma

Thermal annealing effect on InAs/InGaAs quantum dots grown by atomic layer molecular beam epitaxy

2004 ◽  
Vol 269 (2-4) ◽  
pp. 181-186 ◽  
Author(s):  
G.X. Shi ◽  
P. Jin ◽  
B. Xu ◽  
C.M. Li ◽  
C.X. Cui ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Molecular Beam Epitaxy ◽  
Thermal Annealing ◽  
Molecular Beam ◽  
Atomic Layer ◽  
Annealing Effect

InAs self-assembled quantum dots grown on an InP (311)B substrate by molecular beam epitaxy

2001 ◽  
Vol 89 (7) ◽  
pp. 4186-4188 ◽  
Author(s):  
Y. F. Li ◽  
J. Z. Wang ◽  
X. L. Ye ◽  
B. Xu ◽  
F. Q. Liu ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Self Assembled

Excitonic Luminescence from Self-Organized Quantum Dots of CdTe Grown by Molecular Beam Epitaxy

1999 ◽  
Vol 38 (Part 1, No. 4B) ◽  
pp. 2524-2528 ◽  
Author(s):  
Shinji Kuroda ◽  
Yoshikazu Terai ◽  
Kôki Takita ◽  
Tsuyoshi Okuno ◽  
Yasuaki Masumoto
Keyword(s):  
Quantum Dots ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Self Organized ◽  
Excitonic Luminescence
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