High aspect ratio etching of atomic force microscope-patterned nitrided silicon

Author(s):  
Steven A. Harfenist ◽  
Mehdi M. Yazdanpanah ◽  
Robert W. Cohn
2002 ◽  
Vol 80 (24) ◽  
pp. 4623-4625 ◽  
Author(s):  
G. Jänchen ◽  
P. Hoffmann ◽  
A. Kriele ◽  
H. Lorenz ◽  
A. J. Kulik ◽  
...  

2008 ◽  
Vol 19 (23) ◽  
pp. 235704 ◽  
Author(s):  
Minhua Zhao ◽  
Vaneet Sharma ◽  
Haoyan Wei ◽  
Robert R Birge ◽  
Jeffrey A Stuart ◽  
...  

2006 ◽  
Vol 315-316 ◽  
pp. 758-761
Author(s):  
Zong Wei Xu ◽  
Ying Chun Liang ◽  
Shen Dong ◽  
Li Qiang Gu ◽  
T. Sun ◽  
...  

An improved arc welding method was developed to fabricate carbon nanotube probe under direct view of optical microscope. The new fabrication method here needs not coat silicon probe in advance with metal film, which greatly reduces the fabrication’s difficulty. An easy method for shortening the nanotube probe was also developed. The improved fabrication method here is simple and reliable. The fabricated carbon nanotube probe showed good properties of higher length-to-diameter aspect ratio, better wear characteristics than silicon probe.


2020 ◽  
Vol 12 (41) ◽  
pp. 46571-46577
Author(s):  
Heekwon Lee ◽  
Zhuofei Gan ◽  
Mojun Chen ◽  
Siyi Min ◽  
Jihyuk Yang ◽  
...  

2006 ◽  
Vol 45 (14) ◽  
pp. 3201 ◽  
Author(s):  
J. Garnaes ◽  
P.-E. Hansen ◽  
N. Agersnap ◽  
J. Holm ◽  
F. Borsetto ◽  
...  

Author(s):  
K. F. Jarausch ◽  
C. B. Mooney ◽  
D. P. Griffis ◽  
G. M. Shedd ◽  
P. E. Russell

Applications of atomic force microscopy (AFM) for the characterization and metrology of technologically-important objects (e.g. x-ray lithography masks) has led to the development of special-purpose, high-aspect-ratio probes. Measuring objects that have deep, narrow trenches requires a controlled probe geometry. The probe radius and aspect ratio determine the congruence of the acquired AFM image to the true profile of the sample. As is illustrated schematically in Figure 1(a), the usual batch-fabricated AFM probe cannot reach down into deep or narrow trenches. Highaspect- ratio AFM probes that can overcome this limitation (Figure lb), have been developed. Probes of ≤100 nm shaft diameter, and up to microns in length, can be grown by electron-beam contamination writing. Focused ion beams have also been used to sharpen conventional probes by rastering a circular pattern around the highest point, removing the“shoulders” by sputtering, and thereby improving the aspect ratio. Previous work has demonstrated the use of such probes in standard, contact-mode AFM. This paper extends the application of these techniques to the creation of probes for resonance-mode AFM, and characterizes the performance of the resulting probes.


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