Completion of the β tool and the recent progress of low energy e-beam proximity projection lithography

2003 ◽  
Vol 21 (1) ◽  
pp. 311 ◽  
Author(s):  
Akihiro Endo ◽  
Akira Higuchi ◽  
Hiroshi Nozue ◽  
Nobuo Shimazu ◽  
Toyoji Fukui ◽  
...  
Keyword(s):  
Recent Progress ◽  
Low Energy ◽  
Projection Lithography

Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development

2002 ◽  
Author(s):  
Nobuo Shimazu ◽  
Hiroshi Nozue ◽  
Akihiro Endo ◽  
Akira Higuchi ◽  
T. Ise ◽  
...  
Keyword(s):  
Recent Progress ◽  
Low Energy ◽  
Tool Development ◽  
Projection Lithography

New mask format for low-energy electron-beam proximity projection lithography

2002 ◽  
Author(s):  
Kaoru Koike ◽  
Shinji Omori ◽  
Kazuya Iwase ◽  
Isao Ashida ◽  
Shigeru Moriya
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Projection Lithography ◽  
Low Energy Electron

scholarly journals Studies of Electron-Molecule Collisions on Distributed-memory Parallel Computers

1992 ◽  
Vol 45 (3) ◽  
pp. 325 ◽  
Author(s):  
Carl Winstead ◽  
Qiyan Sun ◽  
Paul G Hipes ◽  
Marco AP Lima ◽  
Vincent McKoy
Keyword(s):  
Distributed Memory ◽  
Recent Progress ◽  
Cost Effective ◽  
Parallel Computers ◽  
Polyatomic Molecules ◽  
Low Energy ◽  
Materials Processing ◽  
Challenging Problem ◽  
Molecular Systems ◽  
Critical Data

We review recent progress in the study of low-energy collisions between electrons and polyatomic molecules which has resulted from the application of distributed-memory parallel computing to this challenging problem. Recent studies of electronically elastic and inelastic scattering from several molecular systems, including ethene, propene, cyclopropane, and disilane, are presented. We also discuss the potential of ab initio methods combined with cost-effective parallel computation to provide critical data for the modeling of materials-processing plasmas.

Dynamics of Microstructure in the Early Stages of Ion Beam Assisted Film Growth

1991 ◽  
Vol 237 ◽  
Author(s):  
Harry A. Atwater ◽  
C. J. Tsai ◽  
S. Nikzad ◽  
M.V.R. Murty
Keyword(s):  
Thin Films ◽  
Epitaxial Growth ◽  
Recent Progress ◽  
Film Growth ◽  
Ion Beam ◽  
Surface Interactions ◽  
Low Energy ◽  
Early Stages ◽  
Semiconductor Thin Films ◽  
Nucleation Mechanisms

ABSTRACTRecent progress in low energy ion-surface interactions, and the early stages of ion-assisted epitaxy of semiconductor thin films is described. Advances in three areas are discussed: dynamics of displacements and defect incorporation, nucleation mechanisms, and the use of ion bombardment to modify epitaxial growth kinetics in atrulysurface-selective manner.

Improved Indoor Geo-Localization System

2019 ◽  
pp. 183-206
Author(s):  
Abdaoui Noura ◽  
Ismahène Hadj Khalifa ◽  
Sami Faiz
Keyword(s):  
Sensor Networks ◽  
Recent Progress ◽  
Nearest Neighbor ◽  
Low Energy ◽  
Wireless Sensor ◽  
Detection Accuracy ◽  
K Nearest Neighbor ◽  
Smart Object ◽  
Low Energy Consumption ◽  
Localization Systems

In the concept of internet of things (IOT), physical position of smart object is very useful for relevant function over sensor networks. However, the invalid information of indoor geo-localization systems relative to these wireless sensor compromises the intelligence of IOT network. Therefore, this chapter produces the recent progress in the indoor geo-localization systems and the IOTs area. It defines the best indoor geo-localization technologies that meet their needs while respecting the constraints related to sensor networks. This framework combines between simplicity of Bluetooth low energy (BLE), popular wi-fi infrastructure, and the k-nearest neighbor (KNN) algorithm (in order to filter the initial fingerprint dataset). This new conception increases real-time detection accuracy and guarantees the low energy consumption.

Performance of beta tool for low-energy electron-beam proximity-projection lithography (LEEPL)

2003 ◽  
Author(s):  
Akira Yoshida ◽  
Haruo Kasahara ◽  
Akira Higuchi ◽  
Hiroshi Nozue ◽  
Akihiro Endo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Projection Lithography ◽  
Low Energy Electron
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