Structure and properties of carbon nitride thin films synthesized by nitrogen-ion-beam-assisted pulsed laser ablation

2002 ◽  
Vol 20 (5) ◽  
pp. 1639-1643 ◽  
Author(s):  
Z. Y. Chen ◽  
J. P. Zhao ◽  
T. Yano ◽  
T. Shinozaki ◽  
T. Ooie
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Structure And Properties ◽  
Nitrogen Ion

Optical studies of carbon nitride thin films deposited by reactive pulsed laser ablation of a graphite target in low pressure ammonia

1998 ◽  
Vol 323 (1-2) ◽  
pp. 72-78 ◽  
Author(s):  
I.N Mihailescu ◽  
E Gyorgy ◽  
R Alexandrescu ◽  
A Luches ◽  
A Perrone ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Carbon Nitride ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Low Pressure ◽  
Graphite Target ◽  
Optical Studies

Deposition of Borocarbides Thin Films by Pulsed Laser Ablation: Growth Parameters and Characterization

1999 ◽  
Vol 13 (09n10) ◽  
pp. 1049-1054 ◽  
Author(s):  
C. Ferdeghini ◽  
M.R. Cimberle ◽  
G. Grassano ◽  
D. Marre ◽  
M. Putti ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Growth Parameters ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Film Structure ◽  
Ultra High Vacuum ◽  
Structure And Properties ◽  
Deposition Parameters

In this paper we report results on the growth of borocarbides ErNi 2 B 2C and DyNi 2 B 2 C thin films by an ultra high vacuum laser ablation technique. The dependence of the film structure and properties on the deposition parameters has been studied. Moreover the possibility to obtain superconducting films with a tungsten buffer layer on MgO substrates has been successfully checked. Here we present details on the deposition procedure as well as on the structural, morphological, and physical characterization.

Parametric studies of carbon nitride thin films deposited by reactive pulsed laser ablation

2000 ◽  
Author(s):  
S. Acquaviva ◽  
Emilia D'Anna ◽  
M. L. De Giorgi ◽  
Gilberto Leggieri ◽  
Armando Luches ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Carbon Nitride ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Parametric Studies

A new reactive pulsed laser ablation technique for the deposition of hard carbon and carbon-nitride thin films

1999 ◽  
Vol 39 (2) ◽  
pp. 97-102 ◽  
Author(s):  
I Alexandrou ◽  
I Zergioti ◽  
G.A.J Amaratunga ◽  
M.J.F Healy ◽  
C.J Kiely ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Carbon Nitride ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Hard Carbon ◽  
Ablation Technique ◽  
Laser Ablation Technique

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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