Physical properties of nitrogen-doped diamond-like amorphous carbon films deposited by supermagnetron plasma chemical vapor deposition

Haruhisa Kinoshita; Naoki Otaka

doi:10.1116/1.1488946

Physical properties of nitrogen-doped diamond-like amorphous carbon films deposited by supermagnetron plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1488946 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1481-1485 ◽

Cited By ~ 14

Author(s):

Haruhisa Kinoshita ◽

Naoki Otaka

Keyword(s):

Chemical Vapor Deposition ◽

Physical Properties ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Nitrogen Doped

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High-density plasma chemical vapor deposition of amorphous carbon films

Diamond and Related Materials ◽

10.1016/s0925-9635(03)00371-6 ◽

2003 ◽

Author(s):

A Mousinho

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Density ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Density Plasma

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The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Cited By ~ 15

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.136 ◽

2008 ◽

Vol 255 (5) ◽

pp. 1836-1840 ◽

Cited By ~ 6

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stress Relief ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1349720 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1577-1581 ◽

Cited By ~ 6

Author(s):

Haruhisa Kinoshita ◽

Masahiro Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Qualitative Analysis ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Electrically Conductive ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition

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High-density plasma chemical vapor deposition of amorphous carbon films

Diamond and Related Materials ◽

10.1016/j.diamond.2003.10.024 ◽

2004 ◽

Vol 13 (2) ◽

pp. 311-315 ◽

Cited By ~ 5

Author(s):

A.P. Mousinho ◽

R.D. Mansano ◽

P. Verdonck

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Density ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Density Plasma

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Optoelectronic properties of nitrogenated amorphous carbon films synthesized by microwave surface wave plasma chemical vapor deposition system

Diamond and Related Materials ◽

10.1016/j.diamond.2006.08.005 ◽

2006 ◽

Vol 15 (11-12) ◽

pp. 1894-1897 ◽

Cited By ~ 5

Author(s):

Sudip Adhikari ◽

Hare Ram Aryal ◽

Dilip C. Ghimire ◽

Ashraf M.M. Omer ◽

Sunil Adhikary ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Surface Wave ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Optoelectronic Properties ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition

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Incorporation of Nitrogen into Amorphous Carbon Films Produced by Surface-Wave Plasma Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/5/6/008 ◽

2003 ◽

Vol 5 (6) ◽

pp. 2063-2070 ◽

Cited By ~ 1

Author(s):

Wu Yuxiang ◽

Zhu Xiaodong ◽

Zhan Rujuan

Keyword(s):

Chemical Vapor Deposition ◽

Surface Wave ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition

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Influence of deposition pressure on hydrogenated amorphous carbon films prepared by d.c.-pulse plasma chemical vapor deposition

Surface and Interface Analysis ◽

10.1002/sia.5162 ◽

2012 ◽

Vol 45 (4) ◽

pp. 800-804 ◽

Cited By ~ 4

Author(s):

Chengbing Wang ◽

Jing Shi ◽

Rongbin Xia ◽

Zhongrong Geng

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Pressure ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Self Annealing Effects of Arsenic Ion Implanted Amorphous Carbon Films during Microwave Plasma Chemical Vapor Deposition

Applied Science and Convergence Technology ◽

10.5757/jkvs.2013.22.1.31 ◽

2013 ◽

Vol 22 (1) ◽

pp. 31-36

Author(s):

E.S. Cho ◽

S.J. Kwon

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Annealing Effects

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Photovoltaic characteristics of postdeposition iodine-doped amorphous carbon films by microwave surface wave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2089168 ◽

2005 ◽

Vol 87 (16) ◽

pp. 161912 ◽

Cited By ~ 35

Author(s):

Ashraf M. M. Omer ◽

Sudip Adhikari ◽

Sunil Adhikary ◽

Hideo Uchida ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Surface Wave ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Photovoltaic Characteristics

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