Highly uniform and high optical quality In[sub 0.22]Ga[sub 0.78]As/GaAs quantum wires grown on (221)A GaAs substrate by molecular beam epitaxy

Author(s):  
T. Nitta ◽  
Y. Ohno ◽  
S. Shimomura ◽  
S. Hiyamizu
2008 ◽  
Vol 1 ◽  
pp. 091202 ◽  
Author(s):  
Yoshio Nishimoto ◽  
Ken Nakahara ◽  
Daiju Takamizu ◽  
Atsushi Sasaki ◽  
Kentaro Tamura ◽  
...  

2008 ◽  
Vol 1068 ◽  
Author(s):  
Agam Prakash Vajpeyi ◽  
G. Tsiakatouras ◽  
A Adikimenakis ◽  
K. Tsagaraki ◽  
M Androulidaki ◽  
...  

ABSTRACTThe spontaneous growth of GaN nanopillars on (111) Si by plasma assisted molecular beam epitaxy has been investigated. The growth of GaN nanopillars on Si is driven by the lattice mismatch strain energy on Si and the high surface energy of the nitrogen stabilized (0001) GaN surface. A higher growth rate of nanopillars compared to a compact GaN film suggests the diffusion of Ga atoms from the uncovered substrate areas to the nucleated GaN nanopillars. The GaN nanopillars were characterized by field-emission scanning electron microscopy (FE-SEM), photoluminescence, and micro Raman spectroscopy. SEM image revealed that average diameter of GaN nanopillars was in the range of 70-100nm and an average height of 600nm. The photoluminescence (PL) spectra indicate the good emission property of the nanopillars. The low temperate PL spectrum exhibited an emission peak at 3.428eV besides a sharp excitonic peak. PL and Raman spectra indicate that GaN nanopillars are fully relaxed from lattice and thermal strain.


1983 ◽  
Vol 61 (2) ◽  
pp. 393-396 ◽  
Author(s):  
T. Fujii ◽  
S. Hiyamizu ◽  
O. Wada ◽  
T. Sugahara ◽  
S. Yamakoshi ◽  
...  

1994 ◽  
Vol 33 (Part 1, No. 12B) ◽  
pp. 7199-7203 ◽  
Author(s):  
Yi Liu ◽  
Yoshinori Nishimoto ◽  
Satoshi Shimomura ◽  
Kenji Gamo ◽  
Kazuo Murase ◽  
...  

2002 ◽  
Vol 743 ◽  
Author(s):  
R. Armitage ◽  
Qing Yang ◽  
H. Feick ◽  
S. Y. Tzeng ◽  
J. Lim ◽  
...  

ABSTRACTSemi-insulating wurtzite GaN:C of high optical quality is obtained with CCl4or CS2 doping sources in plasma-assisted molecular-beam epitaxy in Ga-rich growth conditions. The highest resistivity (107Ω-cm) is found for [C] in the low 1018cm−3range. An increasing fraction of carbon appears to form electrically inactive pair defects for higher doping levels causing the concentration of uncompensated residual donors to be higher in films with [C] in the 1019cm−3range compared with [C] in the 1018cm−3range. Blue (2.9 eV) and yellow (2.2 eV) luminescence bands are associated with carbon-related defects, and additional support is provided for the association of the blue luminescence with the carbon-acceptor deactivating pair defect. Finally, the temperature dependence of the resistivity is described within the grain-boundary controlled transport model of Salzmanet al., Appl. Phys. Lett.76, 1431 (2000).


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