Highly reliable chemical–mechanical polishing process for organic low-k methylsilsesquioxane

2001 ◽  
Vol 19 (4) ◽  
pp. 1212 ◽  
Author(s):  
Po-Tsun Liu ◽  
Ting-Chang Chang ◽  
Ming-Chih Huang ◽  
M. S. Tsai ◽  
S. M. Sze
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Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process ◽  
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Delamination analysis of Cu/low-k technology subjected to chemical-mechanical polishing process conditions

2006 ◽  
Vol 46 (9-11) ◽  
pp. 1679-1684 ◽  
Author(s):  
C. Yuan ◽  
W.D. van Driel ◽  
R. van Silfhout ◽  
O. van der Sluis ◽  
R.A.B. Engelen ◽  
...  
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Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Process Conditions ◽  
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Chemical Mechanical Polishing Process ◽  
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Ultrafiltration based on various polymeric membranes for recovery of spent tungsten slurry for reuse in chemical mechanical polishing process

2018 ◽  
Vol 548 ◽  
pp. 232-238 ◽  
Author(s):  
Nur Fatin Amalina Muhammad Sanusi ◽  
Mohd Hizami Mohd Yusoff ◽  
Ooi Boon Seng ◽  
Mohd Sabirin Marzuki ◽  
Ahmad Zuhairi Abdullah
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Chemical Mechanical Polishing ◽  
Polymeric Membranes ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process
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