Ion energy distributions and optical emission spectra in NF[sub 3]-based process chamber cleaning plasmas

2001 ◽  
Vol 19 (4) ◽  
pp. 1346 ◽  
Author(s):  
Hsin-Pai Hsueh ◽  
Robert T. McGrath ◽  
Bing Ji ◽  
Brian S. Felker ◽  
John G. Langan ◽  
...  
Keyword(s):  
Emission Spectra ◽  
Optical Emission ◽  
Energy Distributions ◽  
Ion Energy ◽  
Ion Energy Distributions ◽  
Optical Emission Spectra

Effect of Ion Bombardment on the Structure and Properties of PECVD SiO2

1994 ◽  
Vol 363 ◽  
Author(s):  
Jung H. Lee ◽  
Dong S. Kim ◽  
Young H. Lee
Keyword(s):  
Plasma Reactor ◽  
Substrate Surface ◽  
Emission Spectra ◽  
Optical Emission ◽  
Ion Bombardment ◽  
Ion Energy ◽  
On Line ◽  
Spectrometer Data ◽  
Optical Emission Spectra ◽  
Deposited Films

AbstractSiO2 films were deposited on silicon wafers at 25°C by plasma enhanced decomposition of tetraethoxysilane (TEOS) in a mixture of argon and oxygen. The deposition was performed in a rf-powered (13.56 MIHz) asymmetric plasma reactor. The effect of ion bombardment was evaluated by varying the ion energy flux (IEF) at the substrate surface from 0.93 to 9.94 W/cm2. On-line optical emission spectra (OES) revealed CO, CH, and H peaks whose absorption intensities increased with increasing applied power. On-line mass spectrometer data showed that the peak intensities of OC2H5, SiOH (m/e=45), and HSiOH (m/e=46) fragments decreased with increasing applied power indicating the decomposition of these species. FTIR spectra of the deposited films showed that the concentrations of Si-OH and trapped CO gases in the film decreased with increasing IEF. Also, the FTIR results and the refractive index measurements indicated that the film density increased as a function of IEF. The stoichiometry of the film did not change when IEF was below 2, but for IEF greater than 4.91 W/cm2, the film became Si-rich.

scholarly journals Optical Emission Spectra of Oxygen Plasma Produced by Radio-Frequency Plasma

2009 ◽  
Vol 18 (2) ◽  
pp. 102-107
Author(s):  
Do-Yeob Kim ◽  
Min-Su Kim ◽  
Tae-Hoon Kim ◽  
Ghun-Sik Kim ◽  
Hyun-Young Choi ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Oxygen Plasma ◽  
Emission Spectra ◽  
Optical Emission ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Optical Emission Spectra

scholarly journals REFORMING OF ETHANOL IN PLASMA-CATALYTIC SYSTEM WITH DC AND AC ROTATING GLIDING DISCHARGE

2021 ◽  
pp. 117-121
Author(s):  
O.A. Nedybaliuk ◽  
T.A. Tereshchenko ◽  
I.I. Fedirchyk ◽  
P.V. Tyshchuk ◽  
V.P. Demchina
Keyword(s):  
Synthesis Gas ◽  
Emission Spectra ◽  
Optical Emission ◽  
Reaction Chamber ◽  
Catalytic Reforming ◽  
Instantaneous Power ◽  
Wide Aperture ◽  
Ethanol Reforming ◽  
Gliding Discharge ◽  
Optical Emission Spectra

The article presents the results of the investigation of the reforming of ethanol into synthesis gas using a plasmacatalytic system with either AC or DC wide-aperture rotating gliding discharge. Current and voltage oscillograms of the wide-aperture rotating gliding discharge were measured. The time-dependence of the instantaneous power of the discharge in the air was built. The photographs of the discharge in the airflow and discharge during the ethanol reforming were compared. The optical emission spectra of the plasmas of the torches of AC and DC wide-aperture rotating gliding discharges were studied. The rotational and vibrational temperatures of the plasma torch in the reaction chamber were determined. The results of the gas-chromatography of the synthesis gas produced during the plasm-catalytic reforming of ethanol using either AC or DC rotating gliding discharge are presented.

scholarly journals PREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA

1990 ◽  
Vol 39 (12) ◽  
pp. 1965
Author(s):  
ZHANG FANG-QING ◽  
ZHANG YA-FEI ◽  
YANG YING-HU ◽  
LI JING-QI ◽  
CHEN GUANG-HUA ◽  
...  
Keyword(s):  
Arc Discharge ◽  
Diamond Films ◽  
Emission Spectra ◽  
Optical Emission ◽  
In Situ Measurements ◽  
Dc Arc ◽  
Optical Emission Spectra
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