Insitudetermination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wells

2001 ◽  
Vol 19 (1) ◽  
pp. 292-294 ◽  
Author(s):  
H. M. Ng ◽  
S. N. G. Chu ◽  
A. Y. Cho
2004 ◽  
Vol 43 (No. 12B) ◽  
pp. L1569-L1571 ◽  
Author(s):  
Masataka Ohta ◽  
Tomoyuki Miyamoto ◽  
Tetsuya Matsuura ◽  
Yasutaka Matsui ◽  
Tatsuya Furuhata ◽  
...  

1991 ◽  
Vol 69 (11) ◽  
pp. 7942-7944 ◽  
Author(s):  
K. T. Shiralagi ◽  
R. A. Puechner ◽  
K. Y. Choi ◽  
R. Droopad ◽  
G. N. Maracas

1991 ◽  
Vol 241 ◽  
Author(s):  
Y. Hwang ◽  
D. Zhang ◽  
T. Zhang ◽  
M. Mytych ◽  
R. M. Kolbas

ABSTRACTIn this work we demonstrate that photopumped quantum wellheterostructure lasers with excellent optical quality can be grown ontop of a LT GaAs buffer layer by molecular beam epitaxy. Hightemperature thermal annealing of these lasers blue-shifts the laseremission wavelengths but the presence/absence of a LT GaAs layerhad little effect on the overall laser thresholds. Also, to first order itwas not necessary to include an AlAs barrier layer to preventadverse effects (as has been necessary in the gate stack of MESFETs to prevent carrier compensation).


1991 ◽  
Vol 30 (Part 2, No. 10A) ◽  
pp. L1726-L1728 ◽  
Author(s):  
Yoshinobu Sekiguchi ◽  
Sei-ichi Miyazawa ◽  
Natsuhiko Mizutani

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