Behavior of ultrathin Al2O3 films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdown
2001 ◽
Vol 19
(4)
◽
pp. 1947-1952
◽
2008 ◽
Vol 79
(11)
◽
pp. 113707
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Keyword(s):
1991 ◽
Vol 49
◽
pp. 378-379
1993 ◽
Vol 51
◽
pp. 68-69
1993 ◽
Vol 51
◽
pp. 704-705
1988 ◽
Vol 49
(C6)
◽
pp. C6-55-C6-59
◽