Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication

2000 ◽  
Vol 18 (6) ◽  
pp. 3530 ◽  
Author(s):  
Richard D. Peters ◽  
Xiao M. Yang ◽  
Qiang Wang ◽  
Juan J. de Pablo ◽  
Paul F. Nealey
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Diblock Copolymers

Array of Fe3O4 Nanoparticles in PS-b-P2VP thin Films

2013 ◽  
Vol 345 ◽  
pp. 193-196
Author(s):  
Xin Kang Gao ◽  
Jun Liu ◽  
Ting Hua Wang ◽  
Xue Li ◽  
Xiao Kai Zhang
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Composite Film ◽  
Self Assembly ◽  
Spin Coating ◽  
Diblock Copolymers ◽  
Carbon Substrate ◽  
Mixed Solution ◽  
Long Time ◽  
Oriented Parallel

In this study, a method to generate arrays of Fe3O4 nanoparticles (MNPs) via block copolymer (BC) self-assembly was developed. A composite film of polystyrene-block-poly (2-vinylpyridine) (PS-b-P2VP)/MNPs was first prepared by spin-coating the PS-b-P2VP/MNPs mixed solution on a carbon substrate. After the composite film was annealed at high temperature for 2 days, it was found that the modified MNPs could be selectively incorporated into P2VP cylinders in PS-b-P2VP diblock copolymers and the P2VP cylinders were oriented parallel to the substrate. For a long time annealing (10 days), the P2VP cylinders become normal to the substrate and MNPs are located at the interface of P2VP and PS phases.

scholarly journals Bending Behaviors and Directed Self-assembly of Rod-Coil Block Copolymers

2020 ◽  
Author(s):  
lingying shi ◽  
Sangho Lee ◽  
Qingyang Du ◽  
rong ran ◽  
Runze Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Pattern Generation ◽  
Solvent Annealing ◽  
Line Segments ◽  
Chemical Functionalization ◽  
Triblock Terpolymers ◽  
Line Space

Abstract The formation of zig-zags, chevrons, Y-junctions and line segments is demonstrated in thin films formed from cylindrical morphology Si-containing rod-coil diblock copolymers and triblock terpolymers under solvent annealing. Directed self-assembly of the block copolymers within trenches yields well-ordered cylindrical microdomains oriented either parallel or transverse to the sidewalls depending on the chemical functionalization of the sidewalls, and the location and structure of concentric bends in the cylinders is determined by the shape of the trenches. The innate etching contrast, the spontaneous sharp bends and junctions, and the range of demonstrated periodicity and line/space ratios make these conformationally asymmetric rod-coil polymers attractive for nanoscale pattern generation.

Self-assembly of an interacting binary blend of diblock copolymers in thin films: a potential route to porous materials with reactive nanochannel chemistry

Soft Matter ◽  
2014 ◽  
Vol 10 (31) ◽  
pp. 5755 ◽  
Author(s):  
Jingyi Rao ◽  
Huan Ma ◽  
Julia Baettig ◽  
Sanghoon Woo ◽  
Mihaiela C. Stuparu ◽  
...  
Keyword(s):  
Thin Films ◽  
Porous Materials ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Binary Blend

scholarly journals Segregation of Maghemite Nanoparticles within Symmetric Diblock Copolymer and Triblock Terpolymer Patterns under Solvent Vapor Annealing

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1286
Author(s):  
George Zapsas ◽  
Dimitrios Moschovas ◽  
Konstantinos Ntetsikas ◽  
Andreas Karydis-Messinis ◽  
Nikolaos Chalmpes ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Maghemite Nanoparticles ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
The Matrix ◽  
Solvent Vapor Annealing ◽  
Selective Placement

Block copolymers (BCPs), through their self-assembly, provide an excellent guiding platform for precise controlled localization of maghemite nanoparticles (MNPs). Diblock copolymers (di/BCP) represent the most applied matrix to host filler components due to their morphological simplicity. A series of nanocomposites based on diblock copolymer or triblock terpolymer matrices and magnetic nanoparticles were prepared to study and compare the influence of an additional block into the BCP matrix. MNPs were grafted with low molecular weight polystyrene (PS) chains in order to be segregated in a specific phase of the matrix to induce selective localization. After the mixing of the BCPs with 10% w/v PS-g-MNPs, nanocomposite thin films were formed by spin coating. Solvent vapor annealing (SVA) enabled the PS-g-MNPs selective placement within the PS domains of the BCPs, as revealed by atomic force microscopy (AFM). The recorded images have proven that high amounts of functionalized MNPs can be controllably localized within the same block (PS), despite the architecture of the BCPs (AB vs. ABC). The adopted lamellar structure of the “neat” BCP thin films was maintained for MNPs loading approximately up to 10% w/v, while, for higher content, the BCP adopted lamellar morphology is partially disrupted, or even disappears for both AB and ABC architectures.

scholarly journals Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Wei Cao ◽  
Senlin Xia ◽  
Michael Appold ◽  
Nitin Saxena ◽  
Lorenz Bießmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Weight ◽  
Film Thickness ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Grazing Incidence ◽  
Structure Evolution ◽  
Solvent Vapor ◽  
Chain Mobility ◽  
Ultrahigh Molecular Weight

AbstractUltrahigh molecular weight (UHMW) diblock copolymers (DBCs) have emerged as a promising template for fabricating large-sized nanostructures. Therefore, it is of high significance to systematically study the influence of film thickness and solvent vapor annealing (SVA) on the structure evolution of UHMW DBC thin films. In this work, spin coating of an asymmetric linear UHMW polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) DBC is used to fabricate thin films, which are spherically structured with an inter-domain distance larger than 150 nm. To enhance the polymer chain mobility and facilitate approaching equilibrium nanostructures, SVA is utilized as a post-treatment of the spin coated films. With increasing film thickness, a local hexagonal packing of PMMA half-spheres on the surface can be obtained, and the order is improved at larger thickness, as determined by grazing incidence small angle X-ray scattering (GISAXS). Additionally, the films with locally hexagonal packed half-spherical morphology show a poor order-order-poor order transition upon SVA, indicating the realization of ordered structure using suitable SVA parameters.

Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application

2006 ◽  
Vol 961 ◽  
Author(s):  
Hiroshi Yoshida ◽  
Hirofumi Kitano ◽  
Satoshi Akasaka ◽  
Tomohiro Inoue ◽  
Mikihito Taknaka ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Simple Technique ◽  
Film Surface ◽  
Magnetic Media ◽  
Regular Array ◽  
Block Copolymer Lithography

ABSTRACTBlock copolymer lithography is a promising method for fabricating periodical nano patterns less than 20nm by self-assembly and can be applicable for fabricating patterned magnetic media with recording density over 1Tbit/inch2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Only by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the constituent homopolymer (PS or PMMA), we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.

Hybrid patterns from directed self-assembly of diblock copolymers by chemical patterns

2019 ◽  
Vol 21 (34) ◽  
pp. 18525-18532 ◽  
Author(s):  
Wenfeng Zhao ◽  
Weihua Li
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Critical Factor

The surface affinity is a critical factor for controlling the formation of monolayer nanostructures in block copolymer thin films.

scholarly journals Self-Assembly of Diblock Copolymers/Au Nanoparticle Nanocomposites in Thin Films

2006 ◽  
Vol 12 (S02) ◽  
pp. 606-607
Author(s):  
NL Dietz ◽  
C-T Lo ◽  
B Lee ◽  
RE Winans ◽  
P Thiyagarajan
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Au Nanoparticle

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2005

Self-Assembly of Cylinder-Forming Block Copolymers on Ultrananocrystalline Diamond (UNCD) Thin Films for Lithographic Applications

2009 ◽  
Vol 1203 ◽  
Author(s):  
Muruganathan Ramanathan ◽  
Seth B. Darling ◽  
Anirudha V. Sumant ◽  
Orlando Auciello
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Polymer Chains ◽  
Ultrananocrystalline Diamond ◽  
Pre Treatment ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

AbstractBlock copolymers (BCPs) consist of two or more chemically distinct and incompatible polymer chains (or blocks) covalently bonded. Due to the incompatibility and connectivity constraints between the two blocks, diblock copolymers spontaneously self-assemble into microphase-separated nanoscale domains that exhibit ordered 0, 1, 2 or 3 dimensional morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, or spheres. Block copolymer lithography refers to the use of these ordered structures in the form of thin films as templates for patterning through selective etching or deposition. The self-assembly and domain orientation of block copolymers on a given substrate is critical to realize block copolymer lithography as a tool for large throughput nanolithography applications. In this work, we survey the morphology of cylinder-forming block copolymers by atomic force microscopy (AFM). Three kind of block copolymers were studied: a) poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS b) poly(styrene-block-methylmethacrylate), PS-b-PMMA and c) poly(styrene-block-dimethylsiloxane) PS-b-PDMS. Block copolymers were dissolved in a neutral solvent for both blocks (toluene) in order to obtain solutions of various concentrations (1 and 1.5 wt %). From these solutions, films were prepared by spin casting on ultrananocrystalline diamond (UNCD) thin film substrates. Results indicate that PS-b-PFS exhibits chemical and morphological compatibility to the UNCD surface in terms of wetting and domain control. A systematic comparison of self-assembly of these polymers on silicon nitride substrates demonstrates that UNCD thin films would require pre-treatment to be considered as a substrate for BCP lithography.

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