Hybrid patterns from directed self-assembly of diblock copolymers by chemical patterns

2019 ◽  
Vol 21 (34) ◽  
pp. 18525-18532 ◽  
Author(s):  
Wenfeng Zhao ◽  
Weihua Li
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Critical Factor

The surface affinity is a critical factor for controlling the formation of monolayer nanostructures in block copolymer thin films.

Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application

2006 ◽  
Vol 961 ◽  
Author(s):  
Hiroshi Yoshida ◽  
Hirofumi Kitano ◽  
Satoshi Akasaka ◽  
Tomohiro Inoue ◽  
Mikihito Taknaka ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Simple Technique ◽  
Film Surface ◽  
Magnetic Media ◽  
Regular Array ◽  
Block Copolymer Lithography

ABSTRACTBlock copolymer lithography is a promising method for fabricating periodical nano patterns less than 20nm by self-assembly and can be applicable for fabricating patterned magnetic media with recording density over 1Tbit/inch2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Only by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the constituent homopolymer (PS or PMMA), we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.

Self-Assembly of Cylinder-Forming Block Copolymers on Ultrananocrystalline Diamond (UNCD) Thin Films for Lithographic Applications

2009 ◽  
Vol 1203 ◽  
Author(s):  
Muruganathan Ramanathan ◽  
Seth B. Darling ◽  
Anirudha V. Sumant ◽  
Orlando Auciello
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Polymer Chains ◽  
Ultrananocrystalline Diamond ◽  
Pre Treatment ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

AbstractBlock copolymers (BCPs) consist of two or more chemically distinct and incompatible polymer chains (or blocks) covalently bonded. Due to the incompatibility and connectivity constraints between the two blocks, diblock copolymers spontaneously self-assemble into microphase-separated nanoscale domains that exhibit ordered 0, 1, 2 or 3 dimensional morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, or spheres. Block copolymer lithography refers to the use of these ordered structures in the form of thin films as templates for patterning through selective etching or deposition. The self-assembly and domain orientation of block copolymers on a given substrate is critical to realize block copolymer lithography as a tool for large throughput nanolithography applications. In this work, we survey the morphology of cylinder-forming block copolymers by atomic force microscopy (AFM). Three kind of block copolymers were studied: a) poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS b) poly(styrene-block-methylmethacrylate), PS-b-PMMA and c) poly(styrene-block-dimethylsiloxane) PS-b-PDMS. Block copolymers were dissolved in a neutral solvent for both blocks (toluene) in order to obtain solutions of various concentrations (1 and 1.5 wt %). From these solutions, films were prepared by spin casting on ultrananocrystalline diamond (UNCD) thin film substrates. Results indicate that PS-b-PFS exhibits chemical and morphological compatibility to the UNCD surface in terms of wetting and domain control. A systematic comparison of self-assembly of these polymers on silicon nitride substrates demonstrates that UNCD thin films would require pre-treatment to be considered as a substrate for BCP lithography.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Study of the Kinetics and Mechanism of Rapid Self-Assembly in Block Copolymer Thin Films during Solvo-Microwave Annealing

Langmuir ◽  
2014 ◽  
Vol 30 (35) ◽  
pp. 10728-10739 ◽  
Author(s):  
Parvaneh Mokarian-Tabari ◽  
Cian Cummins ◽  
Sozaraj Rasappa ◽  
Claudia Simao ◽  
Clivia M. Sotomayor Torres ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly ◽  
Kinetics And Mechanism ◽  
Microwave Annealing

Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films

Small ◽  
2015 ◽  
Vol 11 (48) ◽  
pp. 6377-6383 ◽  
Author(s):  
Yecheol Rho ◽  
Karim Aissou ◽  
Muhammad Mumtaz ◽  
Wonsang Kwon ◽  
Gilles Pécastaings ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Array of Fe3O4 Nanoparticles in PS-b-P2VP thin Films

2013 ◽  
Vol 345 ◽  
pp. 193-196
Author(s):  
Xin Kang Gao ◽  
Jun Liu ◽  
Ting Hua Wang ◽  
Xue Li ◽  
Xiao Kai Zhang
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Composite Film ◽  
Self Assembly ◽  
Spin Coating ◽  
Diblock Copolymers ◽  
Carbon Substrate ◽  
Mixed Solution ◽  
Long Time ◽  
Oriented Parallel

In this study, a method to generate arrays of Fe3O4 nanoparticles (MNPs) via block copolymer (BC) self-assembly was developed. A composite film of polystyrene-block-poly (2-vinylpyridine) (PS-b-P2VP)/MNPs was first prepared by spin-coating the PS-b-P2VP/MNPs mixed solution on a carbon substrate. After the composite film was annealed at high temperature for 2 days, it was found that the modified MNPs could be selectively incorporated into P2VP cylinders in PS-b-P2VP diblock copolymers and the P2VP cylinders were oriented parallel to the substrate. For a long time annealing (10 days), the P2VP cylinders become normal to the substrate and MNPs are located at the interface of P2VP and PS phases.

Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films

2015 ◽  
Vol 7 (5) ◽  
pp. 3323-3328 ◽  
Author(s):  
Michael J. Maher ◽  
Charles T. Rettner ◽  
Christopher M. Bates ◽  
Gregory Blachut ◽  
Matthew C. Carlson ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Nanostructured organic radical cathodes from self-assembled nitroxide-containing block copolymer thin films

2015 ◽  
Vol 3 (38) ◽  
pp. 19575-19581 ◽  
Author(s):  
G. Hauffman ◽  
A. Vlad ◽  
T. Janoschka ◽  
U. S. Schubert ◽  
J.-F. Gohy
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Block Copolymer ◽  
Diblock Copolymers ◽  
Organic Radical ◽  
Nanostructured Thin Film ◽  
Self Assembled

Nanostructured thin film organic radical cathodes have been prepared from poly(styrene)-block-poly(2,2,6,6-tetramethylpiperidinyloxy-4-yl methacrylate) diblock copolymers.

Self-Assembly in Block Copolymer Thin Films upon Solvent Evaporation: A Simulation Study

2017 ◽  
Vol 50 (11) ◽  
pp. 4384-4396 ◽  
Author(s):  
Jinlong Hao ◽  
Zhan Wang ◽  
Zheng Wang ◽  
Yuhua Yin ◽  
Run Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Simulation Study ◽  
Self Assembly ◽  
Solvent Evaporation
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