scholarly journals Use of Programmed Piezo Crystal Flexures for Economic Vapor Deposition of Parylene HT® on Unlimited Lengths of Magnet Wire

2018 ◽  
Author(s):  
Tom M. Lawrence ◽  
Marvin D. Kemple

The electronics industry recognizes the need for high-temperature electronics (HTE) particularly for aerospace and geothermal applications. HTE is generally defined as robust operation in temperatures up to 300°C. A major constraint to HTE is high temperature magnet wire which is pervasive in electronic component windings and signal wire for sensors. The magnet wire constraint is caused by the temperature limits of the thin Polytetrafluoroethylene (PTFE) and Fluorinated Ethylene Propylene (FEP) coatings applied to HT magnet wire that limits the operating temperature to 220°C. [1], [2] There are coatings, particularly parylene-based coatings such as parylene HT®, that would greatly improve HT magnet wire, signal wire, and create the potential for subminiature thermocouple (TC) sensors; however, the slow vapor deposition process required to apply parylene is generally thought impractical for use in pore-free coating of long lengths of small diameter wire. For this research, experiments were first performed coating small diameter, wire product prototypes in standard batch vacuum chambers utilizing static fixtures. Finding this approach impractical we devised a new process utilizing a piezo-crystal electrodynamically actuated fixture of 14” diameter by 18” height that supports a web of one 24,500’ long, continuous small-diameter wire. A prototype dynamic fixture was built and a trial run successfully coated a 1500’ length of 0.005” diameter copper wire with Parylene HT®. This successful demonstration was the basis for a DOL Phase I SBIR to explore the feasibility of electrodynamically actuated devises that would synchronize horizontal and vertical actuation to drive horizontal motion to the wire web to enable a continuous reel-to-reel operation for parylene vapor deposition. This is discussed in future work.

Author(s):  
D.W. Susnitzky ◽  
S.R. Summerfelt ◽  
C.B. Carter

Solid-state reactions have traditionally been studied in the form of diffusion couples. This ‘bulk’ approach has been modified, for the specific case of the reaction between NiO and Al2O3, by growing NiAl2O4 (spinel) from electron-transparent Al2O3 TEM foils which had been exposed to NiO vapor at 1415°C. This latter ‘thin-film’ approach has been used to characterize the initial stage of spinel formation and to produce clean phase boundaries since further TEM preparation is not required after the reaction is completed. The present study demonstrates that chemical-vapor deposition (CVD) can be used to deposit NiO particles, with controlled size and spatial distributions, onto Al2O3 TEM specimens. Chemical reactions do not occur during the deposition process, since CVD is a relatively low-temperature technique, and thus the NiO-Al2O3 interface can be characterized. Moreover, a series of annealing treatments can be performed on the same sample which allows both Ni0-NiAl2O4 and NiAl2O4-Al2O3 interfaces to be characterized and which therefore makes this technique amenable to kinetics studies of thin-film reactions.


2000 ◽  
Author(s):  
Vladimir Dmitriev ◽  
T. P. Chow ◽  
Steven P. DenBaars ◽  
Michael S. Shur ◽  
Michael G. Spencer

2021 ◽  
Vol 120 ◽  
pp. 114125
Author(s):  
Motoki Eto ◽  
Noritoshi Araki ◽  
Takashi Yamada ◽  
Masaaki Sugiyama ◽  
Shinji Fujimoto

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