AFM-Based Nanomachining for Nano-Fabrication Processes: MD Simulation and AFM Experimental Verification

2010 ◽  
Author(s):  
Rapeepan Promyoo ◽  
Hazim El-Mounayri ◽  
Ashlie Martini
Keyword(s):  
Friction Coefficient ◽  
Md Simulation ◽  
Computational Models ◽  
Radius Of Curvature ◽  
Nano Fabrication ◽  
Indentation Force ◽  
Atomic Force ◽  
Recent Developments ◽  
Development And Validation ◽  
Vertical Scales

Recent developments in science and engineering have advanced the fabrication techniques for micro/nanodevices. Among them, the atomic force microscope (AFM) has already been used for nanomachining and nanofabrication such as nanolithography, nanowriting and nanopatterning. This paper describes the development and validation of computational models for AFM-based nanomachining (nanoindentation and nanoscratching). The Molecular Dynamics (MD) technique is used to model and simulate mechanical indentation and scratching at the nanoscale for the case of gold. The simulation allows for the prediction of indentation forces and the friction force at the interface between an indenter and a substrate. The effect of scratching speeds on indentation force and friction coefficient is investigated. The material deformation and indentation geometry are extracted based on the final locations of the atoms, which have been displaced by the rigid tool. In addition to the modeling, an AFM was used to conduct actual indentation at the nanoscale, and provide measurements to which the MD simulation predictions can be compared. The AFM provides resolution on the nanometer (lateral) and angstrom (vertical) scales. A three-sided pyramid indenter (with a radius of curvature ∼ 25 nm) is raster scanned on top of the surface and in contact with it. It can be observed from the MD simulation results that the indentation force increases as the depth of indentation increases, but decreases as the scratching speed increases. Moreover, the friction coefficient is found to be independent of scratching speed.

Molecular Dynamics Simulation of AFM-Based Nanomachining Processes

2011 ◽  
Author(s):  
Rapeepan Promyoo ◽  
Hazim El-Mounayri ◽  
Kody Varahramyan ◽  
Ashlie Martini
Keyword(s):  
Molecular Dynamics ◽  
Friction Coefficient ◽  
Md Simulation ◽  
Computational Models ◽  
Dynamics Simulation ◽  
Radius Of Curvature ◽  
Force Microscopy ◽  
Indentation Force ◽  
Atomic Force ◽  
Development And Validation

Recently, atomic force microscopy (AFM) has been widely used for nanomachining and fabrication of micro/ nanodevices. This paper describes the development and validation of computational models for AFM-based nanomachining (nanoindentation and nanoscratching). The Molecular Dynamics (MD) technique is used to model and simulate mechanical indentation and scratching at the nanoscale in the case of gold and silicon. The simulation allows for the prediction of indentation forces and the friction force at the interface between an indenter and a substrate. The effects of tip curvature and speed on indentation force and friction coefficient are investigated. The material deformation and indentation geometry are extracted based on the final locations of atoms, which are displaced by the rigid tool. In addition to modeling, an AFM was used to conduct actual indentation at the nanoscale, and provide measurements to validate the predictions from the MD simulation. The AFM provides resolution on nanometer (lateral) and angstrom (vertical) scales. A three-sided pyramid indenter (with a radius of curvature ∼ 50 nm) is raster scanned on top of the surface and in contact with it. It can be observed from the MD simulation results that the indentation force increases as the depth of indentation increases, but decreases as the scratching speed increases. On the other hand, the friction coefficient is found to be independent of scratching speed.

scholarly journals AFM-Based Nanofabrication: Modeling, Simulation, and Experimental Verification

2013 ◽  
Author(s):  
Rapeepan Promyoo ◽  
Hazim El-Mounayri ◽  
Varun Kumar Karingula ◽  
Kody Varahramyan
Keyword(s):  
Crystal Orientation ◽  
Md Simulation ◽  
Science And Engineering ◽  
Indentation Force ◽  
Modeling Simulation ◽  
Atomic Force ◽  
Nanofluidic Devices ◽  
Recent Developments ◽  
Applied Forces ◽  
Tip Radius

Recent developments in science and engineering have advanced the fabrication techniques for micro/nanodevices. Among them, atomic force microscope (AFM) has already been used for nanomachining and fabrication of micro/nanodevices. In this paper, a computational model for AFM-based nanofabrication processes is being developed. Molecular Dynamics (MD) technique is used to model and simulate mechanical indentation and scratching at the nanoscale. The effects of AFM-tip radius and crystal orientation are investigated. The simulation is also used to study the effect of the AFM tip speed on the indentation force at the interface between the tip and the substrate/workpiece The material deformation and indentation geometry are extracted from the final locations of atoms, which are displaced by the rigid indenter. Material properties including modulus of elasticity and hardness are estimated. It is found that properties vary significantly at the nanoscale. AFM is used to conduct actual nanoindentation and scratching, to validate the MD simulation. Qualitative agreement is found. Finally, AFM-based fabrication of nanochannels/nanofluidic devices is conducted using different applied forces, scratching length, and feed rate.

AFM-Based Nanoindentation Process: A Comparative Study

2012 ◽  
Author(s):  
Rapeepan Promyoo ◽  
Hazim El-Mounayri ◽  
Kody Varahramyan
Keyword(s):  
Md Simulation ◽  
Computational Models ◽  
Surface Deformation ◽  
Experimental Results ◽  
Computational Time ◽  
Machined Surface ◽  
Indentation Force ◽  
Subsurface Deformation ◽  
Different Types ◽  
Copper Aluminum

Atomic force microscopy (AFM) has been widely used for nanomachining and fabrication of micro/nanodevices. This paper describes the development and validation of computational models for AFM-based nanomachining. Molecular Dynamics (MD) technique is used to model and simulate mechanical indentation at the nanoscale for different types of materials, including gold, copper, aluminum, and silicon. The simulation allows for the prediction of indentation forces at the interface between an indenter and a substrate. The effects of tip materials on machined surface are investigated. The material deformation and indentation geometry are extracted based on the final locations of the atoms, which have been displaced by the rigid tool. In addition to the modeling, an AFM was used to conduct actual indentation at the nanoscale, and provide measurements to which the MD simulation predictions can be compared. The MD simulation results show that surface and subsurface deformation found in the case of gold, copper and aluminum have the same pattern. However, aluminum has more surface deformation than other materials. Two different types of indenter tips including diamond and silicon tips were used in the model. More surface and subsurface deformation can be observed for the case of nanoindentation with diamond tip. The indentation forces at various depths of indentation were obtained. It can be concluded that indentation force increases as depth of indentation increases. Due to limitations on computational time, the quantitative values of the indentation force obtained from MD simulation are not comparable to the experimental results. However, the increasing trends of indentation force are the same for both simulation and experimental results.

Investigations on the positioning accuracy of the Nano Fabrication Machine (NFM-100)

2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Jaqueline Stauffenberg ◽  
Ingo Ortlepp ◽  
Ulrike Blumröder ◽  
Denis Dontsov ◽  
Christoph Schäffel ◽  
...  
Keyword(s):  
Target Position ◽  
Repeated Measurements ◽  
Scanning Probe ◽  
Measuring System ◽  
Direct Drive ◽  
Positioning Accuracy ◽  
Scanning Probe Lithography ◽  
Nano Fabrication ◽  
Atomic Force ◽  
Acceleration And Deceleration

Abstract This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

A Review of Recent Developments in Atomic Force Microscopy Systems With Application to Manufacturing and Biological Processes

2003 ◽  
Author(s):  
Karthik Laxminarayana ◽  
Nader Jalili
Keyword(s):  
Resonance Frequency ◽  
Intermolecular Forces ◽  
Minimal Amount ◽  
Contact Mode ◽  
Tapping Mode ◽  
Atomic Force ◽  
Natural Resonance ◽  
Target Sample ◽  
Recent Developments ◽  
Natural Resonance Frequency

The atomic force microscope (AFM) system has evolved into a useful tool for direct measurements of microstructural parameters and intermolecular forces at nanoscale level with atomic-resolution characterization. Typically, these microcantilever systems are operated in three open-loop modes; non-contact mode, contact mode, and tapping mode. In order to probe electric, magnetic, and/or atomic forces of a selected sample, the non-contact mode is utilized by moving the cantilever slightly away from the sample surface and oscillating the cantilever at or near its natural resonance frequency. Alternatively, the contact mode acquires sample attributes by monitoring interaction forces while the cantilever tip remains in contact with the target sample. The tapping mode of operation combines qualities of both the contact and non-contact modes by gleaning sample data and oscillating the cantilever tip at or near its natural resonance frequency while allowing the cantilever tip to impact the target sample for a minimal amount of time. Recent research on AFM systems has focused on many fabrication and manufacturing processes at molecular levels due to its tremendous surface microscopic capabilities. This paper provides a review of such recent developments in AFM imaging systems with emphasis on operational modes, microcantilever dynamic modeling and control. Due to the important contributions of AFM systems to manufacturing, this paper also provides a comprehensive review of recent applications of different AFM systems in these important areas.

Study on Surface Roughness Based on Dynamic Minimum Thickness of Cut

2011 ◽  
Vol 88-89 ◽  
pp. 34-37
Author(s):  
Kuai Ji Cai
Keyword(s):  
Surface Roughness ◽  
Friction Coefficient ◽  
Atomic Force Microscope ◽  
Surface Quality ◽  
Experimental Verification ◽  
Cutting Parameters ◽  
Minimum Thickness ◽  
Atomic Force ◽  
Relationship Of ◽  
The Relationship

The relationship of the friction coefficient and the MTC were discussed, and the MTC and its effects on surface roughness were a theoretical analysised and experimental verification by AFM (atomic force microscope). The results show that the theoretical MTC tends to be minimal value then before the adhering effect to reach remarkable. Appropriate adjustments cutting parameters, the cutting process can always micro-cutting phase to reach the steady-thin chip, and no plowing phenomenon. So the surface residues highly were reduced and higher surface quality was achieved.

scholarly journals Electrophysiology of Syncytial Smooth Muscle

2019 ◽  
Vol 13 ◽  
pp. 117906951882191 ◽  
Author(s):  
Rohit Manchanda ◽  
Shailesh Appukuttan ◽  
Mithun Padmakumar
Keyword(s):  
Smooth Muscle ◽  
Action Potentials ◽  
Signal Analysis ◽  
Computational Models ◽  
Vas Deferens ◽  
Contractile Activity ◽  
Smooth Muscles ◽  
Biophysical Analysis ◽  
Recent Developments ◽  
The Many

As in other excitable tissues, two classes of electrical signals are of fundamental importance to the functioning of smooth muscles: junction potentials, which arise from neurotransmission and represent the initiation of excitation (or in some instances inhibition) of the tissue, and spikes or action potentials, which represent the accomplishment of excitation and lead on to contractile activity. Unlike the case in skeletal muscle and in neurons, junction potentials and spikes in smooth muscle have been poorly understood in relation to the electrical properties of the tissue and in terms of their spatiotemporal spread within it. This owes principally to the experimental difficulties involved in making precise electrical recordings from smooth muscles and also to two inherent features of this class of muscle, ie, the syncytial organization of its cells and the distributed innervation they receive, which renders their biophysical analysis problematic. In this review, we outline the development of hypotheses and knowledge on junction potentials and spikes in syncytial smooth muscle, showing how our concepts have frequently undergone radical changes and how recent developments hold promise in unraveling some of the many puzzles that remain. We focus especially on computational models and signal analysis approaches. We take as illustrative examples the smooth muscles of two organs with distinct functional characteristics, the vas deferens and urinary bladder, while also touching on features of electrical functioning in the smooth muscles of other organs.

scholarly journals Physics Comes to the Aid of Medicine—Clinically-Relevant Microorganisms through the Eyes of Atomic Force Microscope

Pathogens ◽  
2020 ◽  
Vol 9 (11) ◽  
pp. 969
Author(s):  
Mateusz Cieśluk ◽  
Piotr Deptuła ◽  
Ewelina Piktel ◽  
Krzysztof Fiedoruk ◽  
Łukasz Suprewicz ◽  
...  
Keyword(s):  
Mammalian Cells ◽  
Antimicrobial Agents ◽  
Antimicrobial Treatment ◽  
Point Of View ◽  
Diagnostic Methods ◽  
Drug Resistant ◽  
Bacterial Strains ◽  
Force Microscopy ◽  
Atomic Force ◽  
Recent Developments

Despite the hope that was raised with the implementation of antibiotics to the treatment of infections in medical practice, the initial enthusiasm has substantially faded due to increasing drug resistance in pathogenic microorganisms. Therefore, there is a need for novel analytical and diagnostic methods in order to extend our knowledge regarding the mode of action of the conventional and novel antimicrobial agents from a perspective of single microbial cells as well as their communities growing in infected sites, i.e., biofilms. In recent years, atomic force microscopy (AFM) has been mostly used to study different aspects of the pathophysiology of noninfectious conditions with attempts to characterize morphological and rheological properties of tissues, individual mammalian cells as well as their organelles and extracellular matrix, and cells’ mechanical changes upon exposure to different stimuli. At the same time, an ever-growing number of studies have demonstrated AFM as a valuable approach in studying microorganisms in regard to changes in their morphology and nanomechanical properties, e.g., stiffness in response to antimicrobial treatment or interaction with a substrate as well as the mechanisms behind their virulence. This review summarizes recent developments and the authors’ point of view on AFM-based evaluation of microorganisms’ response to applied antimicrobial treatment within a group of selected bacteria, fungi, and viruses. The AFM potential in development of modern diagnostic and therapeutic methods for combating of infections caused by drug-resistant bacterial strains is also discussed.

Adhesion Strength Evaluation of Low-k Interconnect Structures Using a Nanoscratch Method

2004 ◽  
Vol 812 ◽  
Author(s):  
Jiping Ye ◽  
Kenichi Ueoka ◽  
Nobuo Kojima ◽  
Junichi Shimanuki ◽  
Miyoko Shimada ◽  
...  
Keyword(s):  
Friction Coefficient ◽  
Critical Load ◽  
Adhesion Strength ◽  
Rare Gas ◽  
Cohesive Failure ◽  
Atomic Force ◽  
Gas Plasma ◽  
Transmission Electron ◽  
Plasma Pretreatment ◽  
Low K

AbstractA convenient nanoscratch method was combined with atomic force microscope (AFM) and transmission electron microscope (TEM) observations to conduct the first-ever evaluation of the adhesion strength of a complicated microstructure Cu/Ta/TaN/pSiO2/low-k/SiC/pSiO2/Si-substrate with the aim of correlating the fracture strength with the results of chemical mechanical polishing (CMP) tests. Concretely, this evaluation focused on the fact that specimens having a low-k layer pretreated with rare-gas plasma prior to the deposition of the SiO2 layer exhibited low delaminated densities in the Cu CMP process. It was found that a specimen with the rare-gas plasma pretreatment exhibited a higher friction coefficient, a higher critical load and brittle adhesive failure resulting from delamination at the interface between the low-k and SiC layers. A specimen without the rare-gas plasma pretreatment displayed a lower friction coefficient, a lower critical load, and ductile cohesive failure in the low-k layer. Because less plastic deformation was observed in the low-k layer subjected to the rare-gas plasma pretreatment, it is assumed that the pretreatment reinforced the mechanical properties of the low-k layer, making it more resistant to ductile cohesive failure. These results agreed with the CMP test data and indicated that the nanoscratch method makes it possible to predict the ability of complicated Cu/low-k interconnect structures to withstand the CMP process.

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