Thickness Uniformity Inspection With Comparison Off-Axis Digital Holography

Author(s):  
Jinan Jin ◽  
Sungbin Jeon ◽  
Janghyun Cho ◽  
No-Cheol Park

This research proposes a comparison off-axis digital holographic technology for thickness uniformity inspection of transparent products. Compared to existing technologies, the comparison off-axis digital holographic method has advantages such as high depth resolution and large field of view. Also, the proposed method can measure the thickness differences between standard product and the ones produced by one shot imaging with tilt correction. Comparative analysis is used to demonstrate the effectiveness.

2021 ◽  
Author(s):  
dongshun zhang ◽  
hao feng ◽  
zhiyuan zheng ◽  
zili zhang ◽  
Haochong Huang

2019 ◽  
Vol 68 (10) ◽  
pp. 104204 ◽  
Author(s):  
Ming-Yu Tang ◽  
Meng-Ting Wu ◽  
Rui-Huan Zang ◽  
Teng-Da Rong ◽  
Yan-Li Du ◽  
...  

2019 ◽  
Vol 48 (6) ◽  
pp. 603008
Author(s):  
张文辉 Zhang Wenhui ◽  
曹良才 Cao Liangcai ◽  
金国藩 Jin Guofan

Author(s):  
P.-F. Staub ◽  
C. Bonnelle ◽  
F. Vergand ◽  
P. Jonnard

Characterizing dimensionally and chemically nanometric structures such as surface segregation or interface phases can be performed efficiently using electron probe (EP) techniques at very low excitation conditions, i.e. using small incident energies (0.5<E0<5 keV) and low incident overvoltages (1<U0<1.7). In such extreme conditions, classical analytical EP models are generally pushed to their validity limits in terms of accuracy and physical consistency, and Monte-Carlo simulations are not convenient solutions as routine tools, because of their cost in computing time. In this context, we have developed an intermediate procedure, called IntriX, in which the ionization depth distributions Φ(ρz) are numerically reconstructed by integration of basic macroscopic physical parameters describing the electron beam/matter interaction, all of them being available under pre-established analytical forms. IntriX’s procedure consists in dividing the ionization depth distribution into three separate contributions:


Author(s):  
Jianheng Huang ◽  
Yaohu Lei ◽  
Xin Liu ◽  
Jinchuan Guo ◽  
Ji Li ◽  
...  

ACS Photonics ◽  
2021 ◽  
Author(s):  
Anders Kokkvoll Engdahl ◽  
Stefan Belle ◽  
Tung-Cheng Wang ◽  
Ralf Hellmann ◽  
Thomas Huser ◽  
...  

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