Robust Design of Flexure Based Nano Precision Compliant Mechanisms With Application to Nano Imprint Lithography

2008 ◽  
Author(s):  
Chinmaya B. Patil ◽  
S. V. Sreenivasan ◽  
Raul G. Longoria
Keyword(s):  
Analytical Model ◽  
Robust Design ◽  
Compliant Mechanisms ◽  
Design Approach ◽  
Iteration Step ◽  
Geometric Errors ◽  
Imprint Lithography ◽  
Flexure Mechanism ◽  
Parasitic Motion ◽  
Nano Imprint

Flexure-based compliant mechanisms are the preferred motion guiding systems for small range, nano-precision positioning applications because of excellent characteristics like friction-free continuous motion. These mechanisms are commonly used in nano fabrication equipment and ultra precision instruments. However, machining imperfections induced geometric errors in the mechanisms are known to cause undesirable parasitic motion and significant loss of precision. A systematic design approach to minimize the sensitivity of the flexure mechanisms to geometric errors induced by machining tolerances is presented here. Central to the design approach is the screw systems based analytical model to study the spatial motion characteristics of flexure mechanisms. Using this model, the parasitic motion is classified into those errors which can be corrected by calibration (extrinsic) and those which are coupled with the mechanism motion and cannot be corrected by apriori calibration (intrinsic). Metric to quantify the intrinsic parasitic motion results naturally from the screw systems analysis, and is used to represent the precision capability of the flexure mechanism. The analytical model enables the selection of geometric parameters of flexure joints of the mechanism via an optimization scheme with the aim of minimizing the parasitic motion metric. The statistical nature of the machining tolerances is accounted for by sampling the random variables at every iteration step of the optimization, leading to a stochastic formulation. The robust design approach is illustrated using a one DOF rotational flexure mechanism that is used in nano-imprint lithography equipment. Numerical results of the optimization indicate up to 40% improvement in the precision capability of the mechanism without any change in the manufacturing tolerance limits. Further, it is shown via eigenscrew analysis of mechanism compliance that the robustness resulting from the optimal flexure joint design can be attributed to the improved compliance distribution.

Analytical and Experimental Characterization of Parasitic Motion in Flexure-Based Selectively Compliant Precision Mechanisms

2008 ◽  
Author(s):  
Chinmaya B. Patil ◽  
S. V. Sreenivasan ◽  
Raul G. Longoria
Keyword(s):  
Degrees Of Freedom ◽  
Compliant Mechanisms ◽  
Ideal Behavior ◽  
Modeling And Analysis ◽  
Flexure Mechanism ◽  
Parasitic Motion ◽  
Pure Rotation ◽  
The One ◽  
Spatial Kinematics

Flexure-based selectively compliant mechanisms with less than six degrees of freedom are capable of meeting the demanding requirements of ultra precision positioning and scanning systems. However, machining imperfections induce undesirable motion and limit the mechanisms precision capability. A spatial kinematics based kinetostatic model is presented here that not only enables determination of inherently spatial parasitic motion due to machining imperfections, but also offers critical geometric insight into the motion characteristics of flexure mechanisms. The analytical development reveals that the geometric errors induced by machining imperfections perturb the special screw systems of motion of ideal flexure mechanisms to their corresponding general screw systems. This insight leads to clearly defined metrics that can capture the non-ideal behavior using screw system theory and is applicable to all selectively compliant mechanisms. This result is illustrated using one and two DOF mechanisms as examples. In the case of rotational DOF flexure mechanisms, the pitch of twist of motion captures the difference between the special and general screw systems and represents the intrinsic parasitic motion. The machining imperfections are regarded as Gaussian random variables with known variance, and the model is used to determine the variance of the pitch of twist via Monte Carlo simulation, leading to determination of the precision capability of the flexure mechanisms. The modeling and analysis is illustrated using one and two DOF rotation flexure mechanisms. Finally, the details of a test setup built to determine the parasitic motion of the one DOF rotational mechanism are presented. Experimental results indicate that the one DOF flexure mechanism is indeed executing screw motion rather than pure rotation.

Analytical Representation of Nano-Scale Parasitic Motion in Flexure-Based Selectively Compliant Mechanisms

2007 ◽  
Author(s):  
Chinmaya B. Patil ◽  
S. V. Sreenivasan ◽  
Raul G. Longoria
Keyword(s):  
Compliant Mechanisms ◽  
Screw Theory ◽  
Geometric Errors ◽  
Modeling And Analysis ◽  
Parasitic Motion ◽  
Nano Scale ◽  
Flexure Joints ◽  
Improved Design ◽  
Kinetostatic Model ◽  
Spatial Kinematics

Analytical modeling of selectively compliant mechanisms for quantifying the nano-scale parasitic motion is presented. Flexure-based compliant mechanisms are capable of meeting the demanding requirements of the partially constrained ultraprecision motion systems. However, the geometric errors induced by manufacturing tolerances can limit the precision capability. Understanding parasitic motion at the nano-scale necessitates a 3-D model even for mechanisms that are designed to be planar. A spatial kinematics based kinetostatic model is used here. This approach systematically accounts for the geometric errors, and enables estimation of the inherently spatial parasitic motion. Using insights from screw theory, the parasitic motion is classified into intrinsic mechanism errors, and errors that can be minimized by calibration procedures. A metric that quantifies the intrinsic parasitic motion and characterizes the precision capability of the mechanism is identified. Monte Carlo simulation is used to propagate the variance of the geometric errors through the model to determine the statistical moments of the chosen metric. To illustrate the approach, the modeling and analysis is applied to a classical four-bar mechanism with flexure joints. The model is further used to investigate the key system parameters that influence the intrinsic parasitic motion in the mechanism. The simulation results indicate more than 50% improvement in the precision capability of the four-bar mechanism by improved design of flexure joints, without changing the manufacturing tolerance limits.

scholarly journals Removal of Polymer for Nano-imprint Lithography using Atomic Hydrogen Generated by the Hot-wire Catalyzer

2011 ◽  
Vol 24 (4) ◽  
pp. 383-388 ◽  
Author(s):  
Akihiko Kono ◽  
Takashi Maruoka ◽  
Arai Yu ◽  
Yoshihiko Hirai ◽  
Hideo Horibe
Keyword(s):  
Atomic Hydrogen ◽  
Imprint Lithography ◽  
Hot Wire ◽  
Nano Imprint

Submicron Patterned Anodic Oxidation of Aluminum Thin Films

2000 ◽  
Vol 636 ◽  
Author(s):  
Qiyu Huang ◽  
Whye-Kei Lye ◽  
David M. Longo ◽  
Michael L. Reed
Keyword(s):  
Thin Films ◽  
Anodic Oxidation ◽  
Ion Beam ◽  
Electrochemical Anodization ◽  
Optical Methods ◽  
Imprint Lithography ◽  
Aluminum Films ◽  
Aspect Ratios ◽  
Potential Applications ◽  
Nano Imprint

AbstractAlumina formed by the electrochemical anodization of bulk aluminum has a regular porous structure [1]. Sub-100 nm pores with aspect ratios as high as 1000:1 can easily be formed [2] without elaborate processing. Anodization of aluminum thus provides the basis for the inexpensive, high throughput microfabrication of structures with near vertical sidewalls [2]. In this work we explore the patterned anodic oxidation of deposited aluminum thin films, facilitating the integration of this technique with established microfabrication tools. An anodization barrier of polymethylmethacrylate (PMMA) is deposited onto 300 nm thick aluminum films. The barrier film is subsequently patterned and the exposed aluminum anodized in a 10% sulfuric acid solution. Barrier patterning techniques utilized in this study include optical exposure, ion-beam milling and nano-imprint lithography. Sharp edge definition on micron scale patterns has been achieved using optical methods. Extension of this technique to smaller dimensions by ion-beam milling and nano-imprint lithography is presented. We further report on the observation of contrast reversal of anodization with very thin PMMA barriers, which provides a novel means of pattern transfer. Potential applications and challenges will be discussed.

Resist behaviour during peeling release in nano-imprint lithography

2016 ◽  
Author(s):  
Florian Chalvin ◽  
Naoto Nakamura ◽  
Takamitsu Tochino ◽  
Masaaki Yasuda ◽  
Hiroaki Kawata ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Nano Imprint

Electrical nano-imprint lithography

2012 ◽  
Vol 23 (25) ◽  
pp. 255302 ◽  
Author(s):  
L Ressier ◽  
E Palleau ◽  
S Behar
Keyword(s):  
Imprint Lithography ◽  
Nano Imprint

Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano-imprint lithography

2008 ◽  
Author(s):  
Hyun Wook Ro ◽  
Ronald L. Jones ◽  
Huagen Peng ◽  
Hae-Jeong Lee ◽  
Eric K. Lin ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Low Dielectric ◽  
Nano Imprint

Improved reliability PERC PV modules with moth-eye nanostructured optical films using nano imprint lithography

2021 ◽  
pp. 114320
Author(s):  
Kyoung-Suk Oh ◽  
Seong-Hyeon Cho ◽  
Jin-Young Choi ◽  
Kyung-jin Lee ◽  
Sung-il Chan
Keyword(s):  
Imprint Lithography ◽  
Optical Films ◽  
Pv Modules ◽  
Nano Imprint
Sign in / Sign up

Export Citation Format

Share Document