Effects of Microstructure of Compacted Graphite Iron in Tribological Strategy

2018 ◽  
Vol 140 (5) ◽  
Author(s):  
Arnaud Duchosal ◽  
Damien Joly ◽  
René Leroy ◽  
Roger Serra
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Multilayer Coating ◽  
Three Dimensional ◽  
Single Layer ◽  
Chemical Vapor ◽  
Compacted Graphite Iron ◽  
Compacted Graphite ◽  
Pvd Coating

In this paper, the effect of compacted graphite iron (CGI) microstructure has been investigated in tribological strategy. From industrial context, two coatings have been chosen: a single layer coating (physical vapor deposition (PVD)) and a multilayer coating (chemical vapor deposition (CVD)). Pin-on-disk tests have been done to analyze wear mechanisms and to directly obtain the coefficient of friction. Rotation speed of the disk has been adjusted to get the same linear velocity on different disk radii to get up to 150 m min−1 similar to machining condition. Three-dimensional (3D) profilometer, scanning electron microscopy, and nano-indentation were used to observe the track profiles, the pin, and the disk wears and to measure the hardness of microstructure components, respectively. Results showed that PVD coating was more abrasive and had more volume of sticking materials. Chemical vapor deposition coating, which could be the most appropriate for machining CGI, has a real antisticking property and has less friction coefficient than PVD coating. But the presence of small TiCN precipitates in CGI material has a proven negative effect in CVD coating lifetime.

scholarly journals CVD and PVD coating process modelling by using artificial neural networks

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Film Coating ◽  
Deposition Process ◽  
Thin Film Coating ◽  
Mlp Neural Network ◽  
Titanium Thin Film ◽  
Pvd Coating

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.

A Three-Dimensional Analysis of Particle Deposition for the Modified Chemical Vapor Deposition (MCVD) Process

1992 ◽  
Vol 114 (3) ◽  
pp. 735-742 ◽  
Author(s):  
Y. T. Lin ◽  
M. Choi ◽  
R. Greif
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Particle Deposition ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Secondary Flows ◽  
Circumferential Direction ◽  
Forced Flow ◽  
Flow Rates ◽  
Entry Length

A study has been made of the deposition of particles that occurs during the modified chemical vapor deposition (MCVD) process. The three-dimensional conservation equations of mass, momentum, and energy have been solved numerically for forced flow, including the effects of buoyancy and variable properties in a heated, rotating tube. The motion of the particles that are formed is determined from the combined effects resulting from thermophoresis and the forced and secondary flows. The effects of torch speed, rotational speed, inlet flow rate, tube radius, and maximum surface temperature on deposition are studied. In a horizontal tube, buoyancy results in circumferentially nonuniform temperature and velocity fields and particle deposition. The effect of tube rotation greatly reduces the nonuniformity of particle deposition in the circumferential direction. The process is chemical-reaction limited at larger flow rates and particle-transport limited at smaller flow rates. The vertical tube geometry has also been studied because its symmetric configuration results in uniform particle deposition in the circumferential direction. The “upward” flow condition results in a large overall deposition efficiency, but this is also accompanied by a large “tapered entry length.”

Heteroepitaxial Nucleation and Growth of Ge ON Si(100) Surfaces Using Remote Plasma Enhanced Chemical Vapor Deposition

1988 ◽  
Vol 116 ◽  
Author(s):  
R.A. Rudder ◽  
S.V. Hattangady ◽  
D.J. Vitkavage ◽  
R.J. Markunas
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Layer By Layer ◽  
Heteroepitaxial Growth ◽  
Remote Plasma ◽  
Dimensional Growth ◽  
Diffraction Patterns

Heteroepitaxial growth of Ge on Si(100) has been accomplished using remote plasma enhanced chemical vapor deposition at 300*#x00B0;C. Reconstructed surfaces with diffraction patterns showing non-uniform intensity variations along the lengths of the integral order streaks are observed during the first 100 Å of deposit. This observation of an atomically rough surface during the initial stages of growth is an indication of three-dimensional growth. As the epitaxial growth proceeds, the diffraction patterns become uniform with extensive streaking on both the integral and fractional order streaks. Subsequent growth, therefore, takes place in a layer-by-layer, two-dimensional mode. X-ray photoelectron spectroscopy of the early nucleation stages, less than 80 Å, show that there is uniform coverage with no evidence of island formation.

Hybrid single-layer/bulk tungsten diselenide transistors by lithographic encoding of material thickness in chemical vapor deposition

2D Materials ◽  
2018 ◽  
Vol 6 (1) ◽  
pp. 015017 ◽  
Author(s):  
Ingrid Liao ◽  
David Barroso ◽  
Ariana E Nguyen ◽  
Natalie Duong ◽  
Quinten B Yurek ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Single Layer ◽  
Chemical Vapor ◽  
Tungsten Diselenide ◽  
Material Thickness

scholarly journals Correction: Direct chemical vapor deposition synthesis of large area single-layer brominated graphene

RSC Advances ◽  
2019 ◽  
Vol 9 (28) ◽  
pp. 16057-16057
Author(s):  
Maria Hasan ◽  
Wang Meiou ◽  
Liu Yulian ◽  
Sami Ullah ◽  
Huy Q. Ta ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Single Layer ◽  
Chemical Vapor ◽  
Large Area

Correction for ‘Direct chemical vapor deposition synthesis of large area single-layer brominated graphene’ by Maria Hasan et al., RSC Adv., 2019, 9, 13527–13532.

scholarly journals Welding, Joining, and Coating of Metallic Materials

Materials ◽  
2020 ◽  
Vol 13 (11) ◽  
pp. 2640
Author(s):  
Michael Zinigrad ◽  
Konstantin Borodianskiy
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Metallic Substrate ◽  
Metallic Materials ◽  
Special Issue ◽  
Different Types ◽  
Recent Developments ◽  
Micro Arc Oxidation

Welding, joining, and coating of metallic materials are among the most applicable fabrication processes in modern metallurgy. Welding or joining is the manufacture of a metal one-body workpiece from several pieces. Coating is the process of production of metallic substrate with required properties of the surface. A long list of specific techniques is studied during schooling and applied in industry; several include resistant spot, laser or friction welding, micro arc oxidation (MAO), chemical vapor deposition (CVD), and physical vapor deposition (PVD), among others. This Special Issue presents 21 recent developments in the field of welding, joining, and coating of various metallic materials namely, Ti and Mg alloys, different types of steel, intermetallics, and shape memory alloys.

Synthesis of three-dimensional graphene from petroleum asphalt by chemical vapor deposition

2014 ◽  
Vol 122 ◽  
pp. 285-288 ◽  
Author(s):  
Zhuchen Liu ◽  
Zhiqiang Tu ◽  
Yongfeng Li ◽  
Fan Yang ◽  
Shuang Han ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Petroleum Asphalt
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