Characterization of Compressive Die Stresses in CBGA Microprocessor Packaging Due to Component Assembly and Heat Sink Clamping

2012 ◽  
Vol 134 (3) ◽  
Author(s):  
Jordan C. Roberts ◽  
Mohammad Motalab ◽  
Safina Hussain ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
...  

Microprocessor packaging in modern workstations and servers often consists of one or more large flip chip die that are mounted to a high performance ceramic chip carrier. The final assembly configuration features a complex stack up of flip chip area array solder interconnects, underfill, ceramic substrate, lid, heat sink, thermal interface materials (TIMs), second level ceramic ball grid array (CBGA) solder joints, organic printed circuit board, etc., so that a very complicated set of loads is transmitted to the microprocessor chip. Several trends in the evolution of this packaging architecture have exacerbated die stress levels including the transition to larger die, high coefficient of thermal expansion (CTE) ceramic substrates, lead free solder joints, higher levels of power generation, and larger heat sinks with increased clamping forces. Die stress effects are of concern due to several reasons including degradation of silicon device performance (mobility/speed), damage that can occur to the copper/low-k top level interconnect layers, and potential mechanical failure of the silicon in extreme cases. In this work, test chips containing piezoresistive stress sensors have been used to measure the buildup of mechanical stresses in a microprocessor die after various steps of the flip chip CBGA assembly process. The utilized (111) silicon test chips were able to measure the complete three-dimensional stress state at each sensor site being monitored by the data acquisition hardware. Special test fixtures were developed to eliminate any additional stresses due to clamping effects. The developed normal stresses are compressive (triaxial compression) across the die surface, with significant in-plane and out-of-plane (interfacial) shear stresses also present at the die corners. The compressive stresses increase with each assembly step (flip chip solder joint reflow, underfill dispense and cure, and lid attachment). The experimental observations from this study show clearly that large area array flip chips are subjected to relatively large compressive in-plane normal stresses after solder reflow. We also observed that the majority of the die compressive stress is accumulated during the underfilling assembly step. Typical increases in the stress magnitude were on the order of 300% (relative to the stresses due to solder joint reflow only). As a general “rule of thumb,” approximately two-thirds (∼66%) of the final die stress magnitudes were observed to be developed during the underfill dispense and cure, with the second largest contribution coming from the die attachment, and the smallest contribution coming from lid attachment. The experimental test chip stress measurements were correlated with finite element simulations of the packaging process. A sequential modeling approach has been utilized to predict the build-up of compressive stress. The utilized method incorporates precise thermal histories of the packaging process, element creation, and nonlinear temperature and time dependent material properties. With suitable detail in the models, excellent correlation has been obtained with the sensor data throughout all packaging processes. Finally, CBGAs with the stress sensing chips were soldered to organic printed circuit board (PCB) test boards. A simulated heat sink loading applied, and the stresses were measured as a function of the clamping force. Compressive stress changes of up to − 60 MPa were observed for a 1000 N applied clamping force. The experimental test chip stress measurements were correlated with finite element simulations of the clamping process. With suitable detail in the models, excellent correlation has been obtained for the stress changes occurring during simulated heat sink clamping.

1996 ◽  
Vol 118 (2) ◽  
pp. 101-104 ◽  
Author(s):  
John Lau ◽  
Eric Schneider ◽  
Tom Baker

The reliability of solder bumped flip chips on organic coated copper (OCC) printed circuit board (PCB) has been studied by shock and vibration tests and a mathematical analysis. Two different chip sizes (7 mm and 14 mm on a side) have been studied, and the larger chips have many internal solder bumps. For the in-plane and out-of-plane and out-of-plane shock tests, the chips were assembled with and without underfill encapsulants. However, for the out-of-plane vibration tests all the chips were underfilled with epoxy.


2000 ◽  
Vol 3 (4) ◽  
pp. 335-338
Author(s):  
Fuminari MORI ◽  
Kazushige TORIYAMA ◽  
Naoki KATSU ◽  
Ikuo SHOHJI

2004 ◽  
Vol 2004 (0) ◽  
pp. 265-266
Author(s):  
Hiroshi KOBAYASHI ◽  
Kenji KOBAE ◽  
Takashi KUBOTA ◽  
Yukio OZAKI

2001 ◽  
Author(s):  
V. H. Adams ◽  
T.-Y. Tom Lee

Abstract Alternative interconnect strategies are being considered in place of the standard wire bond interconnect for GaAs power amplifier MMIC devices due to cost and electrical performance improvements. The package/die thermal performance consequences are potentially high-risk issue to these interconnect strategies and requires evaluation. Thermal simulations are conducted to compare and evaluate the thermal performances of three interconnect strategies: wire bond, gold post-flip chip, and through via interconnects. The test vehicle simulated is a three-stage, dual band power amplifier integrated circuit dissipating approximately 5 W steady-state power. Parametric studies are conducted to evaluate the impact of the printed circuit board, die thickness, solid gold vias, and design enhancements on package thermal performance. Best thermal performance is provided by a wire bonded, thin GaAs die attached with solder die attach to a printed circuit board that maximizes the number of plated-through-holes directly under the die. This configuration results in a best case junction-to-heat sink thermal resistance of 12 °C/W. Optimum flip chip and through via designs result in degraded thermal performance compared to the above described wire bond design but may have acceptable thermal performance. For these simulations, predicted junction-to-heatsink thermal resistance is in a range of 15–20 °C/W and is better than a comparable wire bonded design that uses a conductive epoxy die attach material.


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