Area-Selective Adhesive Bonding Using Photosensitive BCB for WL CSP Applications
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This paper reports on an area-selective adhesive wafer bonding, using photosensitive BCB from Dow Co. The strength of the fabricated bonds is characterized using the wedge-opening and tensile methods. The measured fracture toughness is 53.5±3.9J/m2 with tensile strength up to 71 MPa. The potential application of BCB bonding is demonstrated on a concept of wafer-level chip-scale package for RF applications and microfilter array for microfluidic applications.
2016 ◽
Vol 2016
(DPC)
◽
pp. 001222-001254
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1986 ◽
Vol 102
(1182)
◽
pp. 469-475
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