OPTICAL EMISSION SPECTROSCOPY OF CARBON ARC DISCHARGE PLASMA

2015 ◽  
Vol 74 (8) ◽  
Author(s):  
Kashif Chaudhary ◽  
Usman Tariq ◽  
Sufi Roslan ◽  
Ong Shude ◽  
M. S. Aziz

The arc discharge plasma is one of the efficient technique to fabricate nano-structures such as nanotubes, nanoparticles and thin films, which have variety of technological applications. In this study, plasma dynamics such as the electron density and temperature for arc discharge carbon plasma in methane ambient environment is presented to investigate the impact and contribution of physical parameter as arc current and ambient pressure on the plasma dynamics. The electron temperature and density is estimated applying in situ optical emission spectroscopy. The optical spectra are recorded for applied arc current 50A, 60A, 70A, 80A and 90A for ambient pressures 100torr, 300torr and 500torr. A rise in electron temperature and electron density is detected with increase in applied arc current and ambient pressure. The obtained results reveal that in arc discharge process, the arc current and ambient pressure have significant contribution towards the kinetics of the plasma species.

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.


Nano Research ◽  
2018 ◽  
Vol 11 (3) ◽  
pp. 1470-1481 ◽  
Author(s):  
Jian Gao ◽  
Lei Zhou ◽  
Jingshuang Liang ◽  
Ziming Wang ◽  
Yue Wu ◽  
...  

2010 ◽  
Vol 107 (5) ◽  
pp. 053305 ◽  
Author(s):  
Sergey G. Belostotskiy ◽  
Tola Ouk ◽  
Vincent M. Donnelly ◽  
Demetre J. Economou ◽  
Nader Sadeghi

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