Characterization and comparison of high-k metal-insulator-metal (MiM) capacitors in 0.13 μm Cu BEOL for mixed-mode and RF applications

2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) ◽

10.1109/vlsit.2003.1221095 ◽

2004 ◽

Cited By ~ 6

Author(s):

Y.L. Tu ◽

H.L. Lin ◽

L.L. Chao ◽

D. Wu ◽

C.S. Tsai ◽

...

Keyword(s):

Mixed Mode ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

Rf Applications ◽

Mim Capacitors

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Characterization and comparison of two metal-insulator-metal capacitor schemes in 0.13 μm copper dual damascene metallization process for mixed-mode and RF applications

Digest. International Electron Devices Meeting, ◽

10.1109/iedm.2002.1175822 ◽

2003 ◽

Cited By ~ 7

Author(s):

C.H. Ng ◽

K.W. Chew ◽

J.X. Li ◽

T.T. Tjoa ◽

L.N. Goh ◽

...

Keyword(s):

Mixed Mode ◽

Metal Insulator ◽

Dual Damascene ◽

Metal Insulator Metal ◽

Rf Applications ◽

Metallization Process

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New insight into tantalum pentoxide Metal-Insulator-Metal (MIM) capacitors: Leakage current modeling, self-heating, reliability assessment and industrial applications

2008 IEEE International Reliability Physics Symposium ◽

10.1109/relphy.2008.4558891 ◽

2008 ◽

Cited By ~ 2

Author(s):

V. Martinez ◽

C. Besset ◽

F. Monsieur ◽

D. Ney ◽

L. Montes ◽

...

Keyword(s):

Leakage Current ◽

Reliability Assessment ◽

Industrial Applications ◽

Tantalum Pentoxide ◽

Metal Insulator ◽

Self Heating ◽

Metal Insulator Metal ◽

Insight Into ◽

Mim Capacitors

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Design of radio frequency metal-insulator-metal (MIM) capacitors

Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004. ◽

10.1109/icsict.2004.1434989 ◽

2005 ◽

Cited By ~ 4

Author(s):

M.W.C. Goh ◽

Queennie Lim ◽

R.A. Keating ◽

A.V. Kordesch ◽

Y.B.M. Yusof

Keyword(s):

Radio Frequency ◽

Metal Insulator ◽

Metal Insulator Metal ◽

Mim Capacitors

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Single mask metal-insulator-metal (MIM) capacitor with copper damascene metallization for sub-0.18 μm mixed mode signal and system-on-a-chip (SoC) applications

Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) ◽

10.1109/iitc.2000.854297 ◽

2002 ◽

Author(s):

Ruichen Liu ◽

Cheng-Yih Lin ◽

E. Harris ◽

S. Merchant ◽

S.W. Downey ◽

...

Keyword(s):

Mixed Mode ◽

Metal Insulator ◽

Metal Insulator Metal ◽

System On A Chip

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Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitors

Applied Physics Letters ◽

10.1063/1.2803221 ◽

2007 ◽

Vol 91 (17) ◽

pp. 172909 ◽

Cited By ~ 41

Author(s):

F. El Kamel ◽

P. Gonon ◽

C. Vallée

Keyword(s):

Experimental Evidence ◽

Oxygen Vacancies ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal

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Nine-Element Lumped Metal-Insulator-Metal (MIM) Capacitor Model for RF Applications

2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium ◽

10.1109/iemt.2006.4456489 ◽

2006 ◽

Cited By ~ 2

Author(s):

Kalavathi Subramaniam ◽

Albert Victor Kordesch ◽

Mazlina Esa

Keyword(s):

Metal Insulator ◽

Metal Insulator Metal ◽

Rf Applications

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Very high K and high density TiTaO MIM capacitors for analog and RF applications

Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. ◽

10.1109/.2005.1469213 ◽

2005 ◽

Cited By ~ 25

Author(s):

K.C. Chiang ◽

A. Chin ◽

C.H. Lai ◽

W.J. Chen ◽

C.F. Cheng ◽

...

Keyword(s):

High Density ◽

High K ◽

Rf Applications ◽

Very High ◽

Mim Capacitors

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Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications

Thin Solid Films ◽

10.1016/j.tsf.2013.03.045 ◽

2013 ◽

Vol 536 ◽

pp. 68-73 ◽

Cited By ~ 3

Author(s):

A. Abrutis ◽

M. Lukosius ◽

M. Skapas ◽

S. Stanionyte ◽

V. Kubilius ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

Metal Organic ◽

Organic Precursors ◽

High K Dielectric ◽

Organic Chemical Vapor Deposition

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WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

Thin Solid Films ◽

10.1016/j.tsf.2009.12.008 ◽

2009 ◽

Author(s):

Rakesh Sohal ◽

Grzegorz Lupina ◽

Peter Zaumseil ◽

Thomas Schroeder

Keyword(s):

Thin Films ◽

Metal Insulator ◽

Dielectric Thin Films ◽

High K ◽

Metal Insulator Metal ◽

Device Applications ◽

High K Dielectric

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