Thermal and Electrical Stability Assessment of AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistors (MOS-HEMTs) With HfO2 Gate Dielectric
2018 ◽
Vol 65
(8)
◽
pp. 3142-3148
◽
2012 ◽
Vol 33
(7)
◽
pp. 997-999
◽
2011 ◽
Vol 50
(4)
◽
pp. 04DF03
◽
2012 ◽
Vol 45
(4)
◽
pp. 045105
◽