Thermal and Electrical Stability Assessment of AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistors (MOS-HEMTs) With HfO2 Gate Dielectric

2018 ◽  
Vol 65 (8) ◽  
pp. 3142-3148 ◽  
Author(s):  
Z. Gao ◽  
M. F. Romero ◽  
F. Calle
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