Design and Characterization of Sloped-Field-Plate Enhanced Trench Edge Termination

2017 ◽  
Vol 64 (3) ◽  
pp. 728-734 ◽  
Author(s):  
Wentao Yang ◽  
Hao Feng ◽  
Xiangming Fang ◽  
Yong Liu ◽  
Yuichi Onozawa ◽  
...  
Keyword(s):  
2019 ◽  
Vol 66 (10) ◽  
pp. 4251-4257 ◽  
Author(s):  
Yong Liu ◽  
Wentao Yang ◽  
Hao Feng ◽  
Linhua Huang ◽  
Yuichi Onozawa ◽  
...  

2017 ◽  
Vol 730 ◽  
pp. 102-105
Author(s):  
Ey Goo Kang

The silicon carbide (SiC) material is being spotlighted as a next-generation power semiconductor material due to the characteristic limitations of the existing silicon materials. SiC has a wider band gap, higher breakdown voltage, higher thermal conductivity, and higher saturation electron mobility than Si. However, actual SiC SBDs exhibit a lower dielectric breakdown voltage than the theoretical breakdown voltage that causes the electric field concentration, a phenomenon that occurs on the edge of the contact surface as in the conventional power semiconductor devices. In this paper, we designed an edge termination structure using a field plate structure through oxide etch angle control, and optimized the structure to obtain a high breakdown voltage. The experiment results indicated that oxide etch angle was 45° when the breakdown voltage characteristics of the SiC SBD were optimized and a breakdown voltage of 681V was obtained.


2001 ◽  
Vol 48 (12) ◽  
pp. 2659-2664 ◽  
Author(s):  
M.C. Tarplee ◽  
V.P. Madangarli ◽  
Quinchun Zhang ◽  
T.S. Sudarshan

2014 ◽  
Vol 778-780 ◽  
pp. 800-803 ◽  
Author(s):  
Run Hua Huang ◽  
Gang Chen ◽  
Song Bai ◽  
Rui Li ◽  
Yun Li ◽  
...  

4H-SiC JBS diode with breakdown voltage higher than 4.5 kV, has been successfully fabricated on 4H-SiC wafers with epitaxial layer. In this paper we report the design, the fabrication, and the electrical characteristics of 4H-SiC JBS diode. Numerical simulations have been performed to select the doping level and thickness of the drift layer and the effectiveness of the edge termination technique. The epilayer properties of the N-type are 55 μm with a doping of 9×1014cm−3. The diodes were fabricated with a floating guard rings edge termination. The on-state voltage was 4V at JF=80 A/cm2


2000 ◽  
Vol 338-342 ◽  
pp. 1223-1226 ◽  
Author(s):  
Q. Zhang ◽  
V. Madangarli ◽  
M. Tarplee ◽  
Tangali S. Sudarshan

2016 ◽  
Vol 37 (4) ◽  
pp. 471-473 ◽  
Author(s):  
Wentao Yang ◽  
Hao Feng ◽  
Xiangming Fang ◽  
Yuichi Onozawa ◽  
Hiroyuki Tanaka ◽  
...  

2010 ◽  
Vol 19 (4) ◽  
pp. 047305 ◽  
Author(s):  
Chen Feng-Ping ◽  
Zhang Yu-Ming ◽  
Zhang Yi-Men ◽  
Lü Hong-Liang ◽  
Song Qing-Wen

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