Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II–Experimental Results and Impacts on Device Variability

Runsheng Wang; Xiaobo Jiang; Tao Yu; Jiewen Fan; Jiang Chen; David Z. Pan; Ru Huang

doi:10.1109/ted.2013.2283517

Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II–Experimental Results and Impacts on Device Variability

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2283517 ◽

2013 ◽

Vol 60 (11) ◽

pp. 3676-3682 ◽

Cited By ~ 30

Author(s):

Runsheng Wang ◽

Xiaobo Jiang ◽

Tao Yu ◽

Jiewen Fan ◽

Jiang Chen ◽

...

Keyword(s):

Line Width ◽

Cmos Technology ◽

Experimental Results ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

Edge Roughness ◽

On Line

Download Full-text

Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I–Modeling and Simulation Method

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2283518 ◽

2013 ◽

Vol 60 (11) ◽

pp. 3669-3675 ◽

Cited By ~ 22

Author(s):

Xiaobo Jiang ◽

Runsheng Wang ◽

Tao Yu ◽

Jiang Chen ◽

Ru Huang

Keyword(s):

Modeling And Simulation ◽

Line Width ◽

Simulation Method ◽

Cmos Technology ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

Edge Roughness ◽

On Line

Download Full-text

Investigations on the correlation between line-edge-roughness (LER) and line-width-roughness (LWR) in nanoscale CMOS technology

2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology ◽

10.1109/icsict.2012.6466733 ◽

2012 ◽

Cited By ~ 1

Author(s):

Xiaobo Jiang ◽

Meng Li ◽

Runsheng Wang ◽

Jiang Chen ◽

Ru Huang

Keyword(s):

Line Width ◽

Cmos Technology ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

Edge Roughness

Download Full-text

Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.016503 ◽

2014 ◽

Vol 54 (1) ◽

pp. 016503

Author(s):

Takahiro Kozawa

Keyword(s):

Line Width ◽

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Defect Generation ◽

Chemically Amplified ◽

Edge Roughness ◽

On Line

Download Full-text

Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Cited By ~ 44

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

Download Full-text

Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Line Width ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

Edge Roughness

Download Full-text

Influence of image processing on line-edge roughness in CD-SEM measurement

10.1117/12.775664 ◽

2008 ◽

Cited By ~ 12

Author(s):

Atsuko Yamaguchi ◽

Jiro Yamamoto

Keyword(s):

Image Processing ◽

Line Edge Roughness ◽

Edge Roughness ◽

On Line

Download Full-text

Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.3268365 ◽

2009 ◽

Vol 8 (4) ◽

pp. 043004 ◽

Cited By ~ 9

Author(s):

Vassilios Constantoudis

Keyword(s):

Plasma Etching ◽

Experimental Results ◽

Line Edge Roughness ◽

Modeling Approaches ◽

Edge Roughness

Download Full-text

Improvement of Line Width Roughness and Line Edge Roughness for Ultrascaled Finfet Technologies

ECS Meeting Abstracts ◽

10.1149/ma2018-01/22/1393 ◽

2018 ◽

Keyword(s):

Line Width ◽

Line Edge Roughness ◽

Edge Roughness

Download Full-text

Characterization of line edge roughness and line width roughness of nano-scale typical structures

2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems ◽

10.1109/nems.2009.5068582 ◽

2009 ◽

Cited By ~ 5

Author(s):

Zhuangde Jiang ◽

Fengxia Zhao ◽

Weixuan Jing ◽

Philip D. Prewett ◽

Kyle Jiang

Keyword(s):

Line Width ◽

Line Edge Roughness ◽

Nano Scale ◽

Edge Roughness

Download Full-text

Line edge roughness: experimental results related to a two-parameter model

Microelectronic Engineering ◽

10.1016/s0167-9317(04)00109-1 ◽

2004 ◽

Vol 73-74 ◽

pp. 265-270 ◽

Cited By ~ 22

Author(s):

L LEUNISSEN

Keyword(s):

Experimental Results ◽

Line Edge Roughness ◽

Edge Roughness ◽

Two Parameter

Download Full-text