Reduction of Charge Trapping in $\hbox{HfO}_{2}$ Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers
2012 ◽
Vol 59
(9)
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pp. 2350-2356
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2013 ◽
Vol 31
(1)
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pp. 01A101
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2018 ◽
Vol 6
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pp. 950-955
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2011 ◽
Vol 11
(7)
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pp. 5887-5891
2021 ◽
Vol 39
(6)
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pp. 062405