Low-Frequency Noise Investigation and Noise Variability Analysis in High- $k$/Metal Gate 32-nm CMOS Transistors

2011 ◽  
Vol 58 (8) ◽  
pp. 2310-2316 ◽  
Author(s):  
Diana Lopez ◽  
S. Haendler ◽  
C. Leyris ◽  
Gregory Bidal ◽  
Gérard Ghibaudo
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
Variability Analysis ◽  
Cmos Transistors ◽  
High K

Investigation of low-frequency noise of 28-nm technology process of high-k/metal gate p-MOSFETs with fluorine incorporation

2016 ◽  
Vol 115 ◽  
pp. 7-11
Author(s):  
Tsung-Hsien Kao ◽  
Shoou-Jinn Chang ◽  
Yean-Kuen Fang ◽  
Po-Chin Huang ◽  
Bo-Chin Wang ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
High K ◽  
Technology Process ◽  
28 Nm

Improving Low-Frequency Noise in 14-nm FinFET by Optimized High-k/Metal Gate Thermal Processing

2021 ◽  
pp. 1-1
Author(s):  
Hao Zhu ◽  
Bin Ye ◽  
Chengkang Tang ◽  
Xianghui Li ◽  
Qingqing Sun ◽  
...  
Keyword(s):  
Thermal Processing ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
High K

Impact of Trap Behavior in High-k/Metal Gate p-MOSFET with Incorporated Fluorine on Low-Frequency Noise Characteristics

2014 ◽  
Author(s):  
T.–H. Kao ◽  
S.–L. Wu ◽  
C.–Y. Wu ◽  
Y.–K. Fang ◽  
P.–C. Huang ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
Noise Characteristics ◽  
High K

Impact of Aluminum Ion Implantation on the Low Frequency Noise Characteristics of Hf-Based High-\(k\) /Metal Gate pMOSFETs

2014 ◽  
Vol 35 (9) ◽  
pp. 954-956 ◽  
Author(s):  
Tsung-Hsien Kao ◽  
Osbert Cheng ◽  
Shoou-Jinn Chang ◽  
San-Lein Wu ◽  
Chung-Yi Wu ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
Aluminum Ion ◽  
Noise Characteristics ◽  
High K

Low-Frequency-Noise-Based Oxide Trap Profiling in Replacement High-k/Metal-Gate pMOSFETs

2013 ◽  
Vol 58 (9) ◽  
pp. 281-292 ◽  
Author(s):  
E. R. Simoen ◽  
J.-W. Lee ◽  
A. Veloso ◽  
V. Paraschiv ◽  
N. Horiguchi ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
High K ◽  
Oxide Trap

On the Oxide Trap Density and Profiles of 1-nm EOT Metal-Gate Last CMOS Transistors Assessed by Low-Frequency Noise

2013 ◽  
Vol 60 (11) ◽  
pp. 3849-3855 ◽  
Author(s):  
Eddy Simoen ◽  
Anabela Veloso ◽  
Yuichi Higuchi ◽  
Naoto Horiguchi ◽  
Cor Claeys
Keyword(s):  
Low Frequency ◽  
Trap Density ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
Cmos Transistors ◽  
Oxide Trap

Investigation of Low-Frequency Noise in High-k First/Metal Gate Last HfO2 and ZrO2 nMOSFETs

2014 ◽  
Author(s):  
S.L. Wu ◽  
B.C. Wang ◽  
Y.Y. Lu ◽  
S.C. Tsai ◽  
J.F. Chen ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Metal Gate ◽  
High K
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