Analytic Assessment of the Significant Emission Area and Integrated Enhancement Factor for Ellipsoidal Electron Field Emitters

2010 ◽  
Vol 57 (12) ◽  
pp. 3491-3499
Author(s):  
A. Gilad Kusne ◽  
David N. Lambeth
2013 ◽  
Vol 6 (4) ◽  
pp. 386-412 ◽  
Author(s):  
Meirong Sui ◽  
Ping Gong ◽  
Xiuquan Gu

1992 ◽  
Vol 39 (11) ◽  
pp. 2648-2649
Author(s):  
D. Liu ◽  
T.S. Ravi ◽  
R.B. Marcus

2021 ◽  
Vol 2103 (1) ◽  
pp. 012116
Author(s):  
E O Popov ◽  
A G Kolosko ◽  
S V Filippov ◽  
S A Ponyaev

Abstract The work is aimed at obtaining microscopic emission characteristics of individual emission sites of a multi-tip field cathode or large-area emitter (LAFE) based on processing the current-voltage characteristics and emission glow patterns. Processing was carried out on a hardware-software complex for the study of field emission characteristics in real time. The calculation of the microscopic characteristics of the local emission sites — the field enhancement factor and emission area — was carried out by several different algorithms. A comparison of the results showed that the algorithms gave close values of the characteristics, which increases the reliability of the estimates made.


Carbon ◽  
2002 ◽  
Vol 40 (10) ◽  
pp. 1715-1728 ◽  
Author(s):  
Jean-Marc Bonard ◽  
Mirko Croci ◽  
Christian Klinke ◽  
Ralph Kurt ◽  
Olivier Noury ◽  
...  

2014 ◽  
Vol 25 (24) ◽  
pp. 245704 ◽  
Author(s):  
Emily Gidcumb ◽  
Bo Gao ◽  
Jing Shan ◽  
Christy Inscoe ◽  
Jianping Lu ◽  
...  

2016 ◽  
Vol 81 ◽  
pp. 59-63 ◽  
Author(s):  
H.H. Bertan ◽  
D.S. Roveri ◽  
G.M. Sant'Anna ◽  
J.F. Mologni ◽  
E.S. Braga ◽  
...  

RSC Advances ◽  
2016 ◽  
Vol 6 (53) ◽  
pp. 47292-47297 ◽  
Author(s):  
Y. M. Juan ◽  
S. J. Chang ◽  
H. T. Hsueh ◽  
S. H. Wang ◽  
T. C. Cheng ◽  
...  

Cu rods with a diameter of 10 μm on a flexible silicon substrate were fabricated using the through silicon via (TSV) process and chemical mechanical polishing (CMP).


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