Thermally Processed High-Mobility MOS Thin-Film Transistors on Transferable Single-Crystal Elastically Strain-Sharing Si/SiGe/Si Nanomembranes

2008 ◽  
Vol 55 (3) ◽  
pp. 810-815 ◽  
Author(s):  
Hao-Chih Yuan ◽  
M.M. Kelly ◽  
D.E. Savage ◽  
M.G. Lagally ◽  
G.K. Celler ◽  
...  
2021 ◽  
Vol 52 (S1) ◽  
pp. 7-7
Author(s):  
Weihua Wu ◽  
Yi Zhuo ◽  
Fangmei Liu ◽  
Yuanpeng Chen ◽  
Jiangbo Yao ◽  
...  

2011 ◽  
Vol 1315 ◽  
Author(s):  
D. K. Ngwashi ◽  
R. B. M. Cross ◽  
S. Paul ◽  
Andrian P. Milanov ◽  
Anjana Devi

ABSTRACTIn order to investigate the performance of ZnO-based thin film transistors (ZnO-TFTs), we fabricate devices using amorphous hafnium dioxide (HfO2) high-k dielectrics. Sputtered ZnO was used as the active channel layer, and aluminium source/drain electrodes were deposited by thermal evaporation, and the HfO2 high-k dielectrics are deposited by metal-organic chemical vapour deposition (MOCVD). The ZnO-TFTs with high-k HfO2 gate insulators exhibit good performance metrics and effective channel mobility which is appreciably higher in comparison to SiO2-based ZnO TFTs fabricated under similar conditions. The average channel mobility, turn-on voltage, on-off current ratio and subthreshold swing of the high-k TFTs are 31.2 cm2V-1s-1, -4.7 V, ~103, and 2.4 V/dec respectively. We compared the characteristics of a typical device consisting of HfO2 to those of a device consisting of thermally grown SiO2 to examine their potential for use as high-k dielectrics in future TFT devices.


Nature ◽  
2000 ◽  
Vol 404 (6781) ◽  
pp. 977-980 ◽  
Author(s):  
W. A. Schoonveld ◽  
J. Wildeman ◽  
D. Fichou ◽  
P. A. Bobbert ◽  
B. J. van Wees ◽  
...  

2006 ◽  
Vol 89 (11) ◽  
pp. 112108 ◽  
Author(s):  
Shuhei Tatemichi ◽  
Musubu Ichikawa ◽  
Toshiki Koyama ◽  
Yoshio Taniguchi

2013 ◽  
Vol 184 ◽  
pp. 1-4 ◽  
Author(s):  
Hao Chang ◽  
Pengyue Wang ◽  
Haidong Li ◽  
Jidong Zhang ◽  
Donghang Yan

2016 ◽  
Vol 2 (8) ◽  
pp. 1600041 ◽  
Author(s):  
Mojtaba Asadirad ◽  
Ying Gao ◽  
Pavel Dutta ◽  
Shahab Shervin ◽  
Sicong Sun ◽  
...  

2021 ◽  
Vol 42 (10) ◽  
pp. 1480-1483
Author(s):  
Yining Yu ◽  
Nannan Lv ◽  
Dongli Zhang ◽  
Yiran Wei ◽  
Mingxiang Wang

2021 ◽  
Vol 52 (S2) ◽  
pp. 395-398
Author(s):  
Yukiharu Uraoka ◽  
Takanori Takahashi ◽  
Mami Fujii ◽  
J.P. Bermundo ◽  
Ryoko Miyanaga ◽  
...  

2018 ◽  
Vol 39 (12) ◽  
pp. 1864-1867 ◽  
Author(s):  
Yi-Shao Li ◽  
Chun-Yi Wu ◽  
Chan-Yu Liao ◽  
Wen-Hsien Huang ◽  
Jia-Min Shieh ◽  
...  

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