Co salicide technology for sub-0.15 μm FD-SOI and beyond: super-flat silicide and fully-silicided source/drain structure

2000 IEEE International SOI Conference. Proceedings (Cat. No.00CH37125) ◽

10.1109/soi.2000.892775 ◽

2002 ◽

Cited By ~ 2

Author(s):

T. Ichimori ◽

N. Hirashita

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