Modeling of initial stages of annealing for amorphizing arsenic implants

2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502) ◽

10.1109/sispad.2000.871235 ◽

2002 ◽

Cited By ~ 2

Author(s):

P. Fastenko ◽

S.T. Dunham ◽

B. Murphy

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