ESD protection of RF circuits in standard CMOS process

2003 ◽  
Author(s):  
K. Higashi ◽  
A.O. Adan ◽  
M. Fukumi ◽  
N. Tanba ◽  
T. Yoshimasu ◽  
...  
Keyword(s):  
Rf Circuits ◽  
Cmos Process ◽  
Standard Cmos Process ◽  
Esd Protection

Fabrication of Monolithic Integrated Bimaterial Resonant Uncooled IR Sensor

2013 ◽  
Vol 543 ◽  
pp. 176-179 ◽  
Author(s):  
D.Q. Zhao ◽  
Xia Zhang ◽  
P. Liu ◽  
F. Yang ◽  
C. Lin ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Hole Mobility ◽  
Micro Electro Mechanical System ◽  
Cmos Process ◽  
Standard Cmos Process ◽  
Ir Sensor ◽  
Cantilever Structure ◽  
Cmos Mems ◽  
On Chip ◽  
Micro Cantilever

In this work we studied the fabrication of a monolithic bimaterial micro-cantilever resonant IR sensor with on-chip drive circuits. The effects of high temperature process and stress induced performance degradation were investigated. The post-CMOS MEMS (micro electro mechanical system) fabrication process of this IR sensor is the focus of this paper, starting from theoretical analysis and simulation, and then moving to experimental verification. The capacitive cantilever structure was fabricated by surface micromachining method, and drive circuits were prepared by standard CMOS process. While the stress introduced by MEMS films, such as the tensile silicon nitride which works as a contact etch stopper layer for MOSFETs and releasing stop layer for the MEMS structure, increases the electron mobility of NMOS, PMOS hole mobility decreases. Moreover, the NMOS threshold voltage (Vth) shifts, and transconductance (Gm) degrades. An additional step of selective removing silicon nitride capping layer and polysilicon layer upon IC area were inserted into the standard CMOS process to lower the stress in MOSFET channel regions. Selective removing silicon nitride and polysilicon before annealing can void 77% Vth shift and 86% Gm loss.

ESD protection design for Giga-Hz high-speed I/O interfaces in a 130-nm CMOS process

2007 ◽  
Author(s):  
Yuan-Wen Hsiao ◽  
Ming-Dou Ker ◽  
Po-Yen Chiu ◽  
Chun Huang ◽  
Yuh-Kuang Tseng
Keyword(s):  
High Speed ◽  
Cmos Process ◽  
Esd Protection

scholarly journals Integration Of Surface Micromachined Polysilicon Mirrors And A Standard Cmos Process

2005 ◽  
Author(s):  
M. Fischer ◽  
M. Nagele ◽  
D. Eichner ◽  
C. Schollhorn ◽  
R. Strobel
Keyword(s):  
Cmos Process ◽  
Standard Cmos Process

scholarly journals Silicon photonic temperature sensor
employing a ring resonator manufactured
using a standard CMOS process

2010 ◽  
Vol 18 (21) ◽  
pp. 22215 ◽  
Author(s):  
Gun-Duk Kim ◽  
Hak-Soon Lee ◽  
Chang-Hyun Park ◽  
Sang-Shin Lee ◽  
Boo Tak Lim ◽  
...  
Keyword(s):  
Temperature Sensor ◽  
Ring Resonator ◽  
Cmos Process ◽  
Standard Cmos Process ◽  
Silicon Photonic

scholarly journals High Speed and High Responsivity Avalanche Photodiode Fabricated by Standard CMOS Process in Blue Wavelength Region

2018 ◽  
Vol E101.C (7) ◽  
pp. 574-580
Author(s):  
Koichi IIYAMA ◽  
Takeo MARUYAMA ◽  
Ryoichi GYOBU ◽  
Takuya HISHIKI ◽  
Toshiyuki SHIMOTORI
Keyword(s):  
High Speed ◽  
Wavelength Region ◽  
Avalanche Photodiode ◽  
Cmos Process ◽  
High Responsivity ◽  
Standard Cmos Process ◽  
Blue Wavelength
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