Prediction of plasma charging damage during SiO/sub 2/ etching by VicAddress

2003 8th International Symposium Plasma- and Process-Induced Damage. ◽

10.1109/ppid.2003.1200930 ◽

2003 ◽

Author(s):

T. Yagisawa ◽

T. Ohmori ◽

T. Shimada ◽

T. Makabe

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