Damage in III/V semiconductors caused by hard- and soft-etching plasmas

2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) ◽

10.1109/ppid.2000.870644 ◽

2002 ◽

Author(s):

G. Franz ◽

R. Averbeck ◽

M. Auer ◽

J. Lorenz

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